Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 11, Issue 3, 2012, Pages

  Muramatsu, Makoto ^a   Iwashita, Mitsuaki ^a   Kitano, Takahiro ^a   Toshima, Takayuki ^a   Somervell, Mark ^b   Seino, Yuriko ^c   Kawamura, Daisuke ^c   Kanno, Masahiro ^c   Kobayashi, Katsutoshi ^c   Azuma, Tsukasa ^c  

^a TOKYO ELECTRON LTD   (Japan)

^b TOKYO ELECTRON AMERICA INC   (United States)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

directed self assembly lithography; poly(styrene block methyl methacrylate); tetramethylammonium hydroxide; wet development

Indexed keywords

BLOCK COPOLYMERS; ESTERS; LITHOGRAPHY; OXYGEN; STYRENE;

DEVELOPMENT TECHNIQUE; DIRECTED SELF-ASSEMBLY; LOW PRESSURE MERCURY LAMPS; METHYL METHACRYLATES; NANOPATTERNING; OXYGEN PLASMAS; PATTERN FORMATION; PATTERN TRANSFERS; SINGLE-TRACKS; TETRAMETHYL AMMONIUM HYDROXIDE; WET DEVELOPMENT;

SELF ASSEMBLY;

EID: 84863748150     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.11.3.031305     Document Type: Article

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