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Density multiplication and improved lithography by directed block copolymer assembly
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Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
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Self-assembling materials for lithographic patterning: Overview, status, and moving forward
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Pattern scaling with directed self assembly through lithography and etch process integration
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Benjamen Rathsack, Mark Somervell, Josh Hooge, Makoto Muramatsu, Keiji Tanouchi, Takahiro Kitano, Eiichi Nishimura, Koichi Yatsuda, Seiji Nagahara, Iwaki Hiroyuki, Keiji Akai, Takashi Hayakawa, "Pattern scaling with directed self assembly through lithography and etch process integration," Proc. SPIE. 8323, 83230B (2012).
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7
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Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment
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Paulina A. Rincon Delgadillo, Roel Gronheid, Christopher J. Thode, Hengpeng Wu, Yi Cao, Mark Neisser, Mark Somervell, Kathleen Nafus, Paul F. Nealey, "Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment," Journal of Micro/Nanolithography, MEMS, and MOEMS. 11(3), 031302 (2012).
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All track directed self-assembly of block copolymers: Process flow and origin of defects
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Paulina A. Rincon Delgadillo, Roel Gronheid, Christopher J. Thode, Hengpeng Wu, Yi Cao, Mark Somervell, Kathleen Nafus, Paul F. Nealey, "All track directed self-assembly of block copolymers: process flow and origin of defects," Proc. SPIE. 8323, 83230D (2012).
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Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern
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Roel Gronheid, Paulina A. Rincon Delgadillo, Todd R. Younkin, Ivan Pollentier, Mark Somervell, Joshua S. Hooge, Kathleen Nafus, Paul F. Nealey, "Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern," Journal of Micro/Nanolithography, MEMS, and MOEMS. 11(3), 031303 (2012).
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Comparison of directed self-assembly integrations
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Mark Somervell, Roel Gronheid, Joshua Hooge, Kathleen Nafus, Paulina Rincon Delgadillo, Chris Thode, Todd Younkin, Koichi Matsunaga, Ben Rathsack, Steven Scheer, Paul Nealey, "Comparison of directed self-assembly integrations," Proc. SPIE. 8325, 83250G (2012).
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Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma, "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development," Journal of Micro/Nanolithography, MEMS, and MOEMS. 11(3), 031305 (2012).
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12
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Contact-hole patterning for random logic circuits using block copolymer directed self-assembly
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He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, H.-S. Philip Wong, "Contact-hole patterning for random logic circuits using block copolymer directed self-assembly," Proc. SPIE. 8323, 83230W (2012).
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Contact hole shrink process using directed self-assembly
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Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hikazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima, "Contact hole shrink process using directed self-assembly," Proc. SPIE. 8323, 83230Y (2012).
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Chris Bencher, He Yi, Jessica Zhou, Manping Cai, Jeffrey Smith, Liyan Miao, Ofir Montal, Shiran Blitshtein, Alon Lavi, Kfir Dotan, Huixiong Dai, Joy Y. Cheng, Daniel P. Sanders, Melia Tjio, Steven Holmes, "Directed self-assembly defectivity assessment. Part II," Proc. SPIE. 8323, 83230N (2012).
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in press
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Todd R. Younkin, Roel Gronheid, Boon Teik Chan, Ainhoa Romo-Negreira, Kathleen Nafus, Mark H. Somervell, Paulina A. Rincon Delgadillo, "Progress in directed self-assembly hole shrink applications," Proc. SPIE. 8682, S8682-20 (2013), in press.
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