Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 6, 2012, Pages

  Ruiz, Ricardo ^a   Wan, Lei ^a   Lille, Jeffrey ^a   Patel, Kanaiyalal C ^a   Dobisz, Elizabeth ^a   Johnston, Danvers E ^b   Kisslinger, Kim ^b   Black, Charles T ^b  

^a WESTERN DIGITAL CORPORATION   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; DIRECTED SELF-ASSEMBLY; FEATURE SIZES; HIGH CONTRAST; HIGH FIDELITY PATTERN TRANSFER; IMAGE DISTORTIONS; LATENT IMAGES; LINE EDGE ROUGHNESS; METAL OXIDES; PATTERN TRANSFERS; PLASMA ETCH; POLYSTYRENE-B-POLY(METHYL METHACRYLATE); PROCESS COMPATIBILITY; SELF-ASSEMBLED; SIDEWALL PROFILES; WAFER-SCALE;

ATOMIC LAYER DEPOSITION; BLOCK COPOLYMERS; ESTERS; POLYMETHYL METHACRYLATES; POLYSTYRENES; ROUGHNESS MEASUREMENT; SILICON WAFERS;

SELF ASSEMBLY;

EID: 84870340211     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4758773     Document Type: Article

References (28)

1. O. Hellwig, J. K. Bosworth, E. Dobisz, D. Kercher, T. Hauet, G. Zeltzer, J. D. Risner-Jamtgaard, D. Yaney, and R. Ruiz, Appl. Phys. Lett. 96, 052511 (2010). 10.1063/1.3293301
2. H. Wang, M. T. Rahman, H. B. Zhao, Y. Isowaki, Y. Kamata, A. Kikitsu, and J. P. Wang, J. Appl. Phys. 109, 07B754 (2011). 10.1063/1.3562453
3. J. Y. Cheng, D. P. Sanders, H. D. Truong, S. Harrer, A. Friz, S. Holmes, M. Colburn, and W. D. Hinsberg, ACS Nano 4, 4815 (2010). 10.1021/nn100686v
4. C. Bencher, Proc. SPIE 7970, 79700F (2011). 10.1117/12.881293
5. C. T. Black, R. Ruiz, G. Breyta, J. Y. Cheng, M. C. Colburn, K. W. Guarini, H.-C. Kim, and Y. Zhang, IBM J. Res. Dev. 51, 605 (2007). 10.1147/rd.515.0605
6. R. Ruiz, H. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Albrecht, J. J. de Pablo, and P. F. Nealey, Science 321, 936 (2008). 10.1126/science.1157626
7. Y. Tada, S. Akasaka, M. Takenaka, H. Yoshida, R. Ruiz, E. Dobisz, and H. Hasegawa, Polymer 50, 4250 (2009). 10.1016/j.polymer.2009.06.039
8. L. Wan and X. M. Yang, Langmuir 25, 12408 (2009). 10.1021/la901648y
9. J. Y. Cheng, C. T. Rettner, D. P. Sanders, H.-C. Kim, and W. D. Hinsberg, Adv. Mater. 20, 3155 (2008). 10.1002/adma.200800826
10. C. C. Liu, E. Han, M. S. Onses, C. J. Thode, S. X. Ji, P. Gopalan, and P. F. Nealey, Macromolecules 44, 1876 (2011). 10.1021/ma102856t
11. C. T. Black, K. W. Guarini, K. R. Milkove, S. M. Baker, T. P. Russell, and M. T. Tuominen, Appl. Phys. Lett. 79, 409 (2001). 10.1063/1.1383805
12. M. Park, C. Harrison, P. M. Chaikin, R. A. Register, and D. H. Adamson, Science 276, 1401 (1997). 10.1126/science.276.5317.1401
13. K. W. Guarini, C. T. Black, and S. H. I. Yeuing, Adv. Mater. 14, 1290 (2002). 10.1002/1521-4095(20020916)14:18<1290::AID-ADMA1290>3.0.CO;2-N
14. Q. Peng, Y.-C. Tseng, S. B. Darling, and J. W. Elam, Adv. Mater. 22, 5129 (2010). 10.1002/adma.201002465
15. Q. Peng, Y. C. Tseng, S. B. Darling, and J. W. Elam, ACS Nano 5, 4600 (2011). 10.1021/nn2003234
16. Y. C. Tseng, Q. Peng, L. E. Ocola, J. W. Elam, and S. B. Darling, J. Phys. Chem. C 115, 17725 (2011). 10.1021/jp205532e
17. D. E. Johnston, M. Lu, and C. T. Black, J. Micro/Nanolith. MEMS MOEMS 11, 031306 (2012). 10.1117/1.JMM.11.3.031306
18. R. S. Hutton, R. L. Kostelak, O. Nalamasu, A. Kornblit, S. McNevin, and G. N. Taylor, J. Vac. Sci. Technol. B 8, 1502 (1990). 10.1116/1.585105
19. R. R. Li, P. D. Dapkus, M. E. Thompson, W. G. Jeong, C. Harrison, P. M. Chaikin, R. A. Register, and D. H. Adamson, Appl. Phys. Lett. 76, 1689 (2000). 10.1063/1.126137
20. G. Gay, Nanotechnology 21, 435301 (2010). 10.1088/0957-4484/21/43/435301
21. R. Ruiz, E. Dobisz, and T. R. Albrecht, ACS Nano 5, 79 (2011). 10.1021/nn101561p
22. C. C. Liu, C. J. Thode, P. A. R. Delgadillo, G. S. W. Craig, P. F. Nealey, and R. Gronheid, J. Vac. Sci. Technol. B 29, 06F203 (2011). 10.1116/1.3644341
23. C. T. Black, Appl. Phys. Lett. 87, 163116 (2005). 10.1063/1.2112191
24. P. Mansky, Y. Liu, E. Huang, T. P. Russell, and C. Hawker, Science 275, 1458 (1997). 10.1126/science.275.5305.1458
25. R. Ruiz, R. L. Sandstrom, and C. T. Black, Adv. Mater. 19, 587 (2007). 10.1002/adma.200600287
26. M. D. Groner, F. H. Fabreguette, J. W. Elam, and S. M. George, Chem. Mater. 16, 639 (2004). 10.1021/cm0304546
27. L. Wan, J. Micro/Nanolith. MEMS MOEMS 11, 031405 (2012). 10.1117/1.JMM.11.3.031405
28. B. D. Bunday, M. Bishop, D. W. McCormack, Jr., J. S. Villarrubia, A. E. Vladar, R. Dixson, T. V. Vorburger, N. G. Orji, and J. A. Allgair, Proc. SPIE 5375, 515 (2004). 10.1117/12.535926