Directed self-assembly of silicon-containing block copolymer thin films

ACS Applied Materials and Interfaces

Volumn 7, Issue 5, 2015, Pages 3323-3328

  Maher, Michael J ^a,c   Rettner, Charles T ^c   Bates, Christopher M ^a   Blachut, Gregory ^b   Carlson, Matthew C ^b   Durand, William J ^b   Ellison, Christopher J ^b   Sanders, Daniel P ^c   Cheng, Joy Y ^c   Willson, C Grant ^a,b  

^a University of Texas at Austin   (United States)

^b The University of Texas at Austin   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

block copolymers; chemo epitaxy; directed self assembly; grapho epitaxy; lithography; top coats

Indexed keywords

BLOCK COPOLYMERS; LITHOGRAPHY; SILICON; SILICON COMPOUNDS; STYRENE;

BLOCK COPOLYMER THIN FILMS; DIRECTED SELF-ASSEMBLY; HYDROGEN SILSESQUIOXANE; NEUTRAL LAYER; PATTERNED SUBSTRATES; SPACE SUBDIVISION; TOP-COATS;

SELF ASSEMBLY;

EID: 84922797691     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am508197k     Document Type: Article

References (60)

1. Miyake, G. M.; Piunova, V. A.; Weitekamp, R. A.; Grubbs, R. H. Precisely Tunable Photonic Crystals From Rapidly Self-Assembling Brush Block Copolymer Blends Angew. Chem., Int. Ed. 2012, 51, 11246-11248
2. Schulze, M. W.; McIntosh, L. D.; Hillmyer, M. A.; Lodge, T. P. High-Modulus, High-Conductivity Nanostructured Polymer Electrolyte Membranes via Polymerization-Induced Phase Separation Nano Lett. 2014, 14, 122-126
3. Jackson, E. A.; Hillmyer, M. A. Nanoporous Membranes Derived From Block Copolymers: From Drug Delivery to Water Filtration ACS Nano 2010, 4, 3548-3553
4. Bates, C. M.; Maher, M. J.; Janes, D. W.; Ellison, C. J.; Willson, C. G. Block Copolymer Lithography Macromolecules 2014, 47, 2-12
5. 2 and Beyond IEEE Trans. Magn. 2013, 49, 773-778
6. Keen, I.; Yu, A.; Cheng, H.-H.; Jack, K. S.; Nicholson, T. M.; Whittaker, A. K.; Blakey, I. Control of the Orientation of Symmetric Poly (Styrene)-Block-Poly(d,l -lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition Langmuir 2012, 28, 15876-15888
7. Kim, S.; Nealey, P. F.; Bates, F. S. Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films ACS Macro Lett. 2012, 1, 11-14
8. Li, H.; Gu, W.; Li, L.; Zhang, Y.; Russell, T. P.; Coughlin, E. B. Synthesis of Semicrystalline/Fluorinated Side-Chain Crystalline Block Copolymers and Their Bulk and Thin Film Nanoordering Macromolecules 2013, 46, 3737-3745
9. Kennemur, J. G.; Yao, L.; Bates, F. S.; Hillmyer, M. A. Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)- block -poly(methyl methacrylate) Block Polymers for Lithography Macromolecules 2014, 47, 1411-1418
10. Jung, Y.-S.; Ross, C. A. Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene-Polydimethylsiloxane Block Copolymer Nano Lett. 2007, 7, 2046-2050
11. Cushen, J. D.; Otsuka, I.; Bates, C. M.; Halila, S.; Fort, S.; Rochas, C.; Easley, J. A.; Rausch, E. L.; Thio, A.; Borsali, R.; Willson, C. G.; Ellison, C. J. Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications ACS Nano 2012, 6, 3424-3433
12. Bates, C. M.; Pantoja, M. A. B.; Strahan, J. R.; Dean, L. M.; Mueller, B. K.; Ellison, C. J.; Nealey, P. F.; Willson, C. G. Synthesis and Thin-Film Orientation of Poly(styrene- block -trimethylsilylisoprene) J. Polym. Sci., Part A: Polym. Chem. 2012, 51, 290-297
13. Cushen, J. D.; Bates, C. M.; Rausch, E. L.; Dean, L. M.; Zhou, S. X.; Willson, C. G.; Ellison, C. J. Thin Film Self-Assembly of Poly(Trimethylsilylstyrene- b-d,l- Lactide) with Sub-10 nm Domains Macromolecules 2012, 45, 8722-8728
14. Jurgensen, C. W.; Shugard, A.; Dudash, N.; Reichmanis, E.; Vasile, M. J. Experimental Tests of the Steady-State Model for Oxygen Reactive Ion Etching of Silicon-Containing Polymers J. Vac. Sci. Technol., A 1988, 6, 2938-2944
15. Andersen, T. H.; Tougaard, S.; Larsen, N. B.; Almdal, K.; Johannsen, I. Surface Morphology of PS-PDMS Diblock Copolymer Films J. Electron Spectrosc. Relat. Phenom. 2001, 121, 93-110
16. Walton, D. G.; Kellogg, G. J.; Mayes, A. M.; Lambooy, P.; Russell, T. P. A Free Energy Model for Confined Diblock Copolymers Macromolecules 1994, 27, 6225-6228
17. Ryu, D. Y.; Shin, K.; Drockenmuller, E.; Hawker, C. J.; Russell, T. P. A Generalized Approach to the Modification of Solid Surfaces Science 2005, 308, 236-239
18. In, I.; La, Y.-H.; Park, S.-M.; Nealey, P. F.; Gopalan, P. Side-Chain-Grafted Random Copolymer Brushes as Neutral Surfaces for Controlling the Orientation of Block Copolymer Microdomains in Thin Films Langmuir 2006, 22, 7855-7860
19. Bang, J.; Bae, J.; Löwenhielm, P.; Spiessberger, C.; Given-Beck, S. A.; Russell, T. P.; Hawker, C. J. Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography Adv. Mater. 2007, 19, 4552-4557
20. Ji, S.; Liu, C.-C.; Son, J. G.; Gotrik, K.; Craig, G. S. W.; Gopalan, P.; Himpsel, F. J.; Char, K.; Nealey, P. F. Generalization of the Use of Random Copolymers to Control the Wetting Behavior of Block Copolymer Films Macromolecules 2008, 41, 9098-9103
21. Bates, C. M.; Strahan, J. R.; Santos, L. J.; Mueller, B. K.; Bamgbade, B. O.; Lee, J. A.; Katzenstein, J. M.; Ellison, C. J.; Willson, C. G. Polymeric Cross-Linked Surface Treatments for Controlling Block Copolymer Orientation in Thin Films Langmuir 2011, 27, 2000-2006
22. Maher, M. J.; Bates, C. M.; Blachut, G.; Carlson, M. C.; Self, J. L.; Janes, D. W.; Durand, W. J.; Lane, A. P.; Ellison, C. J.; Willson, C. G. Photopatternable Interfaces for Block Copolymer Lithography ACS Macro Lett. 2014, 824-828
23. Seshimo, T.; Bates, C. M.; Dean, L. M.; Cushen, J. D.; Durand, W. J.; Maher, M. J.; Ellison, C. J.; Willson, C. G. Block Copolymer Orientation Control Using a Top-Coat Surface Treatment J. Photopolym. Sci. Technol. 2012, 25, 125-130
24. Bates, C. M.; Seshimo, T.; Maher, M. J.; Durand, W. J.; Cushen, J. D.; Dean, L. M.; Blachut, G.; Ellison, C. J.; Willson, C. G. Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains Science 2012, 338, 775-779
25. Yoshida, H.; Suh, H. S.; Ramirez-Herunandez, A.; Lee, J. I.; Aida, K.; Wan, L.; Ishida, Y.; Tada, Y.; Ruiz, R.; de Pablo, J.; Nealey, P. F. Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films J. Photopolym. Sci. Technol. 2013, 26, 55-58
26. Bates, C. M.; Maher, M. J.; Thio, A.; Dean, L. M.; Cushen, J. D.; Durand, W. J.; Blachut, G.; Li, L.; Ellison, C. J.; Willson, C. G. Polarity-switching Top Coats for Silicon-containing Block Copolymer Orientation Control J. Photopolym. Sci. Technol. 2013, 26, 223-224
27. Ramírez-Hernández, A.; Suh, H. S.; Nealey, P. F.; de Pablo, J. J. Control of Directed Self-Assembly in Block Polymers by Polymeric Topcoats Macromolecules 2014, 47, 3520-3527
28. Mansky, P.; Russell, T. P.; Hawker, C. J.; Pitsikalis, M.; Mays, J. Ordered Diblock Copolymer Films on Random Copolymer Brushes Macromolecules 1997, 30, 6810-6813
29. Peters, R. D.; Yang, X. M.; Nealey, P. F. Morphology of Thin Films of Diblock Copolymers on Surfaces Micropatterned with Regions of Different Interfacial Energy Macromolecules 2002, 35, 1822-1834
30. Kim, S.; Bates, C. M.; Thio, A.; Cushen, J. D.; Ellison, C. J.; Willson, C. G.; Bates, F. S. Consequences of Surface Neutralization in Diblock Copolymer Thin Films ACS Nano 2013, 7, 9905-9919
31. Maher, M. J.; Bates, C. M.; Blachut, G.; Sirard, S.; Self, J. L.; Carlson, M. C.; Dean, L. M.; Cushen, J. D.; Durand, W. J.; Hayes, C. O.; Ellison, C. J.; Willson, C. G. Interfacial Design for Block Copolymer Thin Films Chem. Mater. 2014, 26, 1471-1479
32. Morkved, T. L.; Lu, M.; Urbas, A. M.; Ehrichs, E. E.; Jaeger, H. M.; Mansky, P.; Russell, T. P. Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields Science 1996, 273, 931-933
33. Rockford, L.; Liu, Y.; Mansky, P.; Russell, T. P.; Yoon, M.; Mochrie, S. G. J. Polymers on Nanoperiodic, Heterogeneous Surfaces Phys. Rev. Lett. 1999, 82, 2602-2605
34. Bodycomb, J.; Funaki, Y.; Kimishima, K.; Hashimoto, T. Single-Grain Lamellar Microdomain From a Diblock Copolymer Macromolecules 1999, 32, 2075-2077
35. Segalman, R. A.; Yokoyama, H.; Kramer, E. J. Graphoepitaxy of Spherical Domain Block Copolymer Films Adv. Mater. 2001, 13, 1152-1155
36. Cheng, J. Y.; Ross, C. A.; Thomas, E. L.; Smith, H. I.; Vancso, G. J. Fabrication of Nanostructures with Long-Range Order Using Block Copolymer Lithography Appl. Phys. Lett. 2002, 81, 3657-3659
37. Yang, X. M.; Peters, R. D.; Nealey, P. F.; Solak, H. H.; Cerrina, F. Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned Substrates Macromolecules 2000, 33, 9575-9582
38. Ouk Kim, S.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
39. Ruiz, R.; Kang, H.; Detcheverry Francois, A.; Dobisz, E.; Kercher, D. S.; Albrecht, T. R.; de Pablo, J. J.; Nealey, P. F. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Science 2008, 321, 936-939
40. Doerk, G. S.; Liu, C.-C.; Cheng, J. Y.; Rettner, C. T.; Pitera, J. W.; Krupp, L. E.; Topuria, T.; Arellano, N.; Sanders, D. P. Pattern Placement Accuracy in Block Copolymer Directed Self-Assembly Based on Chemical Epitaxy ACS Nano 2013, 7, 276-285
41. Stoykovich, M. P.; Mueller, M.; Kim, S. O.; Solak, H. H.; Edwards, E. W.; de Pablo, J. J.; Nealey, P. F. Directed Assembly of Block Copolymer Blends Into Nonregular Device-Oriented Structures Science 2005, 308, 1442-1446
42. Doerk, G. S.; Cheng, J. Y.; Rettner, C. T.; Balakrishnan, S.; Arellano, N.; Sanders, D. P. Deterministically Isolated Gratings Through the Directed Self-Assembly of Block Copolymers Proc. SPIE 2013, 8680, 86800Y
43. Chang, J.-B.; Choi, H. K.; Hannon, A. F.; Alexander-Katz, A.; Ross, C. A.; Berggren, K. K. Design Rules for Self-Assembled Block Copolymer Patterns Using Tiled Templates Nat. Commun. 2014, 5, 3305
44. Tsai, H.; Pitera, J. W.; Miyazoe, H.; Bangsaruntip, S.; Engelmann, S. U.; Liu, C.-C.; Cheng, J. Y.; Bucchignano, J. J.; Klaus, D. P.; Joseph, E. A.; Sanders, D. P.; Colburn, M. E.; Guillorn, M. A. Two-Dimensional Pattern Formation Using Graphoepitaxy of PS- b -PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication ACS Nano 2014, 8, 5227-5232
45. Cheng, J. Y.; Sanders, D. P.; Truong, H. D.; Harrer, S.; Friz, A.; Holmes, S.; Colburn, M.; Hinsberg, W. D. Simple and Versatile Methods to Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist ACS Nano 2010, 4, 4815-4823
46. Liu, C.-C.; Nealey, P. F.; Raub, A. K.; Hakeem, P. J.; Brueck, S. R. J.; Han, E.; Gopalan, P. Integration of Block Copolymer Directed Assembly with 193 Immersion Lithography J. Vac. Sci. Technol., B 2010, 28, C6B30-C6B34
47. Liu, C.-C.; Thode, C. J.; Rincon Delgadillo, P. A.; Craig, G. S. W.; Nealey, P. F.; Gronheid, R. Towards an All-Track 300 mm Process for Directed Self-Assembly J. Vac. Sci. Technol., B 2011, 29, 06F203
48. Delgadillo, P. R.; Gronheid, R.; Thode, C. J.; Wu, H.; Yi, C.; Neisser, M.; Somervell, M.; Nafus, K.; Nealey, P. F. Implementation of a Chemo-Epitaxy Flow for Directed Self-Assembly on 300-mm Wafer Processing Equipment J. Micro/Nanolithogr., MEMS, MOEMS 2012, 11, 031302
49. Gronheid, R. Frequency Multiplication of Lamellar Phase Block Copolymers with Grapho-Epitaxy Directed Self-Assembly Sensitivity to Prepattern J. Micro/Nanolithogr., MEMS, MOEMS 2012, 11, 031303
50. Delgadillo, P. R.; Suri, M.; Durant, S.; Cross, A.; Nagaswami, V. R.; Van Den Heuvel, D.; Gronheid, R.; Nealey, P. Defect Source Analysis of Directed Self-Assembly Process J. Micro/Nanolithogr., MEMS, MOEMS. 2013, 12, 031112
51. Mansky, P.; Russell, T. P.; Hawker, C. J.; Mays, J.; Cook, D. C.; Satija, S. K. Interfacial Segregation in Disordered Block Copolymers: Effect of Tunable Surface Potentials Phys. Rev. Lett. 1997, 79, 237-240
52. + Focused Ion Beams Appl. Phys. Lett. 2003, 82, 346
53. Zhao, Y.; Sivaniah, E.; Hashimoto, T. SAXS Analysis of the Order-Disorder Transition and the Interaction Parameter of Polystyrene- block -poly(methyl methacrylate) Macromolecules 2008, 41, 9948-9951
54. Durand, W. J.; Blachut, G.; Maher, M. J.; Sirard, S.; Tein, S.; Carlson, M. C.; Asano, Y.; Zhou, S. X.; Lane, A. P.; Bates, C. M.; Ellison, C. J.; Willson, C. G. Design of High- Block Copolymers for Lithography J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 344-352
55. Grigorescu, A. E.; van der Krogt, M. C.; Hagen, C. W.; Kruit, P. 10nm Lines and Spaces Written in HSQ, Using Electron Beam Lithography Microelectron. Eng. 2007, 84, 822-824
56. Cheng, J. Y.; Rettner, C. T.; Sanders, D. P.; Kim, H.-C.; Hinsberg, W. D. Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers Adv. Mater. 2008, 20, 3155-3158
57. Liu, C.-C.; Ramírez-Hernández, A.; Han, E.; Craig, G. S. W.; Tada, Y.; Yoshida, H.; Kang, H.; Ji, S.; Gopalan, P.; de Pablo, J. J.; Nealey, P. F. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features Macromolecules 2013, 46, 1415-1424
58. Hinsberg, W.; Cheng, J.; Kim, H.-C.; Sanders, D. P. Self-Assembling Materials for Lithographic Patterning: Overview, Status, and Moving Forward Proc. SPIE 2010, 7637, 76370G
59. Farrell, R. A.; Hosler, E. R.; Schmid, G. M.; Xu, J.; Preil, M. E.; Rastogi, V.; Mohanty, N.; Kumar, K.; Cicoria, M. J.; Hetzer, D. R.; Devilliers, A. J. Manufacturability Considerations for DSA Proc. SPIE 2014, 9051, 90510Z
60. Park, S. M.; Stoykovich, M. P.; Ruiz, R.; Zhang, Y.; Black, C. T.; Nealey, P. F. Directed Assembly of Lamellae- Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates Adv. Mater. 2007, 19, 607-611