-
1
-
-
78649834544
-
Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
-
Peng, Q.; Tseng, Y.-C.; Darling, S. B.; Elam, J. W. Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers Adv. Mater. 2010, 22 (45) 5129-5133
-
(2010)
Adv. Mater.
, vol.22
, Issue.45
, pp. 5129-5133
-
-
Peng, Q.1
Tseng, Y.-C.2
Darling, S.B.3
Elam, J.W.4
-
2
-
-
79959784768
-
A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
-
Peng, Q.; Tseng, Y.-C.; Darling, S. B.; Elam, J. W. A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates ACS Nano 2011, 5 (6) 4600-4606
-
(2011)
ACS Nano
, vol.5
, Issue.6
, pp. 4600-4606
-
-
Peng, Q.1
Tseng, Y.-C.2
Darling, S.B.3
Elam, J.W.4
-
3
-
-
79952857798
-
Block Copolymer Nanostructures for Technology
-
Tseng, Y.-C.; Darling, S. B. Block Copolymer Nanostructures for Technology Polymers 2010, 2 (4) 470-489
-
(2010)
Polymers
, vol.2
, Issue.4
, pp. 470-489
-
-
Tseng, Y.-C.1
Darling, S.B.2
-
4
-
-
79961131344
-
Enhanced polymeric lithography resists via sequential infiltration synthesis
-
Tseng, Y.-C.; Peng, Q.; Ocola, L. E.; Czaplewski, D. A.; Elam, J. W.; Darling, S. B. Enhanced polymeric lithography resists via sequential infiltration synthesis J. Mater. Chem. 2011, 21 (32) 11722-11725
-
(2011)
J. Mater. Chem.
, vol.21
, Issue.32
, pp. 11722-11725
-
-
Tseng, Y.-C.1
Peng, Q.2
Ocola, L.E.3
Czaplewski, D.A.4
Elam, J.W.5
Darling, S.B.6
-
5
-
-
84255183804
-
Etch properties of resists modified by sequential infiltration synthesis
-
Tseng, Y.-C.; Peng, Q.; Ocola, L. E.; Czaplewski, D. A.; Elam, J. W.; Darling, S. B. Etch properties of resists modified by sequential infiltration synthesis J. Vac. Sci. Technol. B 2011, 29 (6) 06FG01
-
(2011)
J. Vac. Sci. Technol. B
, vol.29
, Issue.6
, pp. 06FG01
-
-
Tseng, Y.-C.1
Peng, Q.2
Ocola, L.E.3
Czaplewski, D.A.4
Elam, J.W.5
Darling, S.B.6
-
6
-
-
84861019673
-
Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
-
Tseng, Y.-C.; Mane, A. U.; Elam, J. W.; Darling, S. B. Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early Adv. Mater. 2012, 24 (19) 2608-2613
-
(2012)
Adv. Mater.
, vol.24
, Issue.19
, pp. 2608-2613
-
-
Tseng, Y.-C.1
Mane, A.U.2
Elam, J.W.3
Darling, S.B.4
-
7
-
-
84872851940
-
Chemically Enhancing Block Copolymers for Block-Selective Synthesis of Self-Assembled Metal Oxide Nanostructures
-
Kamcev, J.; Germack, D. S.; Nykypanchuk, D.; Grubbs, R. B.; Nam, C.-Y.; Black, C. T. Chemically Enhancing Block Copolymers for Block-Selective Synthesis of Self-Assembled Metal Oxide Nanostructures ACS Nano 2012, 7 (1) 339-346
-
(2012)
ACS Nano
, vol.7
, Issue.1
, pp. 339-346
-
-
Kamcev, J.1
Germack, D.S.2
Nykypanchuk, D.3
Grubbs, R.B.4
Nam, C.-Y.5
Black, C.T.6
-
8
-
-
84870340211
-
Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition
-
Ruiz, R.; Wan, L.; Lille, J.; Patel, K. C.; Dobisz, E.; Johnston, D. E.; Kisslinger, K.; Black, C. T. Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition J. Vac. Sci. Technol. B 2012, 30 (6) 06F202
-
(2012)
J. Vac. Sci. Technol. B
, vol.30
, Issue.6
, pp. 06F202
-
-
Ruiz, R.1
Wan, L.2
Lille, J.3
Patel, K.C.4
Dobisz, E.5
Johnston, D.E.6
Kisslinger, K.7
Black, C.T.8
-
9
-
-
84875852783
-
Highly ordered TiO2 nanostructures by sequential vapour infiltration of block copolymer micellar films in an atomic layer deposition reactor
-
Yin, J.; Xu, Q.; Wang, Z.; Yao, X.; Wang, Y. Highly ordered TiO2 nanostructures by sequential vapour infiltration of block copolymer micellar films in an atomic layer deposition reactor J. Mater. Chem. C 2013, 1 (5) 1029-1036
-
(2013)
J. Mater. Chem. C
, vol.1
, Issue.5
, pp. 1029-1036
-
-
Yin, J.1
Xu, Q.2
Wang, Z.3
Yao, X.4
Wang, Y.5
-
10
-
-
84872720025
-
Plasma etch transfer of self-assembled polymer patterns
-
Johnston, D. E.; Lu, M.; Black, C. T. Plasma etch transfer of self-assembled polymer patterns Proc. SPIE 2012, 8328, 83280A-8
-
(2012)
Proc. SPIE
, vol.8328
, pp. 83280A-8
-
-
Johnston, D.E.1
Lu, M.2
Black, C.T.3
-
11
-
-
84879518072
-
In Situ Synthesis of High Density sub-50 nm ZnO Nanopatterned Arrays Using Diblock Copolymer Templates
-
Suresh, V.; Huang, M. S.; Srinivasan, M. P.; Krishnamoorthy, S. In Situ Synthesis of High Density sub-50 nm ZnO Nanopatterned Arrays Using Diblock Copolymer Templates ACS Appl. Mater. Interfaces 2013, 5 (12) 5727-5732
-
(2013)
ACS Appl. Mater. Interfaces
, vol.5
, Issue.12
, pp. 5727-5732
-
-
Suresh, V.1
Huang, M.S.2
Srinivasan, M.P.3
Krishnamoorthy, S.4
-
12
-
-
10944237170
-
Atomic Layer Deposition of Al2O3 Films on Polyethylene Particles
-
Ferguson, J. D.; Weimer, A. W.; George, S. M. Atomic Layer Deposition of Al2O3 Films on Polyethylene Particles Chem. Mater. 2004, 16 (26) 5602-5609
-
(2004)
Chem. Mater.
, vol.16
, Issue.26
, pp. 5602-5609
-
-
Ferguson, J.D.1
Weimer, A.W.2
George, S.M.3
-
13
-
-
84863931824
-
Quantitative in situ infrared analysis of reactions between trimethylaluminum and polymers during Al2O3 atomic layer deposition
-
Gong, B.; Parsons, G. N. Quantitative in situ infrared analysis of reactions between trimethylaluminum and polymers during Al2O3 atomic layer deposition J. Mater. Chem. 2012, 22 (31) 15672-15682
-
(2012)
J. Mater. Chem.
, vol.22
, Issue.31
, pp. 15672-15682
-
-
Gong, B.1
Parsons, G.N.2
-
14
-
-
28044471578
-
Nucleation and Growth during Al2O3 Atomic Layer Deposition on Polymers
-
Wilson, C. A.; Grubbs, R. K.; George, S. M. Nucleation and Growth during Al2O3 Atomic Layer Deposition on Polymers Chem. Mater. 2005, 17 (23) 5625-5634
-
(2005)
Chem. Mater.
, vol.17
, Issue.23
, pp. 5625-5634
-
-
Wilson, C.A.1
Grubbs, R.K.2
George, S.M.3
-
15
-
-
84885481453
-
Mechanisms and reactions during atomic layer deposition on polymers
-
Parsons, G. N.; Atanasov, S. E.; Dandley, E. C.; Devine, C. K.; Gong, B.; Jur, J. S.; Lee, K.; Oldham, C. J.; Peng, Q.; Spagnola, J. C.; Williams, P. S. Mechanisms and reactions during atomic layer deposition on polymers Coord. Chem. Rev. 2013, 257 (23-24) 3323-3331
-
(2013)
Coord. Chem. Rev.
, vol.257
, Issue.2324
, pp. 3323-3331
-
-
Parsons, G.N.1
Atanasov, S.E.2
Dandley, E.C.3
Devine, C.K.4
Gong, B.5
Jur, J.S.6
Lee, K.7
Oldham, C.J.8
Peng, Q.9
Spagnola, J.C.10
Williams, P.S.11
-
16
-
-
0001172646
-
Direct Conversion of Carboxylic Esters into Ketones Using Organoaluminum Complexes
-
Chung, E.-A.; Cho, C.-W.; Ahn, K. H. Direct Conversion of Carboxylic Esters into Ketones Using Organoaluminum Complexes J. Org. Chem. 1998, 63 (22) 7590-7591
-
(1998)
J. Org. Chem.
, vol.63
, Issue.22
, pp. 7590-7591
-
-
Chung, E.-A.1
Cho, C.-W.2
Ahn, K.H.3
-
17
-
-
84874011948
-
Mechanistic Study of Lithium Aluminum Oxide Atomic Layer Deposition
-
Comstock, D. J.; Elam, J. W. Mechanistic Study of Lithium Aluminum Oxide Atomic Layer Deposition J. Phys. Chem. C 2012, 117 (4) 1677-1683
-
(2012)
J. Phys. Chem. C
, vol.117
, Issue.4
, pp. 1677-1683
-
-
Comstock, D.J.1
Elam, J.W.2
-
18
-
-
64349109641
-
3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
-
3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry J. Phys. Chem. C 2008, 112 (49) 19530-19539
-
(2008)
J. Phys. Chem. C
, vol.112
, Issue.49
, pp. 19530-19539
-
-
Goldstein, D.N.1
McCormick, J.A.2
George, S.M.3
-
19
-
-
0033745593
-
Nanoscopic Templates from Oriented Block Copolymer Films
-
Thurn-Albrecht, T.; Steiner, R.; DeRouchey, J.; Stafford, C. M.; Huang, E.; Bal, M.; Tuominen, M.; Hawker, C. J.; Russell, T. P. Nanoscopic Templates from Oriented Block Copolymer Films Adv. Mater. 2000, 12 (11) 787-791
-
(2000)
Adv. Mater.
, vol.12
, Issue.11
, pp. 787-791
-
-
Thurn-Albrecht, T.1
Steiner, R.2
Derouchey, J.3
Stafford, C.M.4
Huang, E.5
Bal, M.6
Tuominen, M.7
Hawker, C.J.8
Russell, T.P.9
-
20
-
-
0031039786
-
Controlling Polymer-Surface Interactions with Random Copolymer Brushes
-
Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. Controlling Polymer-Surface Interactions with Random Copolymer Brushes Science 1997, 275 (5305) 1458-1460
-
(1997)
Science
, vol.275
, Issue.5305
, pp. 1458-1460
-
-
Mansky, P.1
Liu, Y.2
Huang, E.3
Russell, T.P.4
Hawker, C.5
-
21
-
-
0026140033
-
Thin-film behavior of poly(methyl methacrylates). 2. An FT-IR study of Langmuir-Blodgett films of isotactic PMMA
-
Brinkhuis, R. H. G.; Schouten, A. J. Thin-film behavior of poly(methyl methacrylates). 2. An FT-IR study of Langmuir-Blodgett films of isotactic PMMA Macromolecules 1991, 24 (7) 1496-1504
-
(1991)
Macromolecules
, vol.24
, Issue.7
, pp. 1496-1504
-
-
Brinkhuis, R.H.G.1
Schouten, A.J.2
-
22
-
-
58349088124
-
Investigation on electrical properties of thermally aged PMMA by combined use of FTIR and impedance spectroscopies
-
Namouchi, F.; Smaoui, H.; Fourati, N.; Zerrouki, C.; Guermazi, H.; Bonnet, J. J. Investigation on electrical properties of thermally aged PMMA by combined use of FTIR and impedance spectroscopies J. Alloys Compd. 2009, 469 (1-2) 197-202
-
(2009)
J. Alloys Compd.
, vol.469
, Issue.12
, pp. 197-202
-
-
Namouchi, F.1
Smaoui, H.2
Fourati, N.3
Zerrouki, C.4
Guermazi, H.5
Bonnet, J.J.6
-
24
-
-
0035127775
-
Structural modification of poly(methyl methacrylate) by proton irradiation
-
Choi, H. W.; Woo, H. J.; Hong, W.; Kim, J. K.; Lee, S. K.; Eum, C. H. Structural modification of poly(methyl methacrylate) by proton irradiation Appl. Surf. Sci. 2001, 169-170, 433-437
-
(2001)
Appl. Surf. Sci.
, vol.169-170
, pp. 433-437
-
-
Choi, H.W.1
Woo, H.J.2
Hong, W.3
Kim, J.K.4
Lee, S.K.5
Eum, C.H.6
-
25
-
-
84947579593
-
FTIR studies of titanium tetrachioride- and magnesium dichioride-complexes with aromatic esters relevant to Ziegler-Natta catalysts
-
Solli, K.-A.; Ystenes, M.; Sobota, P. FTIR studies of titanium tetrachioride- and magnesium dichioride-complexes with aromatic esters relevant to Ziegler-Natta catalysts SPIE Proc. 1991, 1575, 608
-
(1991)
SPIE Proc.
, vol.1575
, pp. 608
-
-
Solli, K.-A.1
Ystenes, M.2
Sobota, P.3
-
26
-
-
0000884665
-
Surface phonons in thin aluminum oxide films: Thickness, beam-energy, and symmetry-mixing effects
-
Frederick, B. G.; Apai, G.; Rhodin, T. N. Surface phonons in thin aluminum oxide films: Thickness, beam-energy, and symmetry-mixing effects Phys. Rev. B 1991, 44 (4) 1880-1890
-
(1991)
Phys. Rev. B
, vol.44
, Issue.4
, pp. 1880-1890
-
-
Frederick, B.G.1
Apai, G.2
Rhodin, T.N.3
-
27
-
-
70450206724
-
-
Revision A.02; Gaussian, Inc. Wallingford, CT
-
Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Scalmani, G.; Barone, V.; Mennucci, B.; Petersson, G. A.; Nakatsuji, H.; Caricato, M.; Li, X.; Hratchian, H. P.; Izmaylov, A. F.; Bloino, J.; Zheng, G.; Sonnenberg, J. L.; Hada, M.; Ehara, M.; Toyota, K.; Fukuda, R.; Hasegawa, J.; Ishida, M.; Nakajima, T.; Honda, Y.; Kitao, O.; Nakai, H.; Vreven, T.; Montgomery, J. A., Jr.; Peralta, J. E.; Ogliaro, F.; Bearpark, M.; Heyd, J. J.; Brothers, E.; Kudin, K. N.; Staroverov, V. N.; Kobayashi, R.; Normand, J.; Raghavachari, K.; Rendell, A.; Burant, J. C.; Iyengar, S. S.; Tomasi, J.; Cossi, M.; Rega, N.; Millam, N. J.; Klene, M.; Knox, J. E.; Cross, J. B.; Bakken, V.; Adamo, C.; Jaramillo, J.; Gomperts, R.; Stratmann, R. E.; Yazyev, O.; Austin, A. J.; Cammi, R.; Pomelli, C.; Ochterski, J. W.; Martin, R. L.; Morokuma, K.; Zakrzewski, V. G.; Voth, G. A.; Salvador, P.; Dannenberg, J. J.; Dapprich, S.; Daniels, A. D.; Farkas, Ö.; Foresman, J. B.; Ortiz, J. V.; Cioslowski, J.; Fox, D. J. Gaussian 09, Revision A.02; Gaussian, Inc.: Wallingford, CT, 2009.
-
(2009)
Gaussian 09
-
-
Frisch, M.J.1
Trucks, G.W.2
Schlegel, H.B.3
Scuseria, G.E.4
Robb, M.A.5
Cheeseman, J.R.6
Scalmani, G.7
Barone, V.8
Mennucci, B.9
Petersson, G.A.10
Nakatsuji, H.11
Caricato, M.12
Li, X.13
Hratchian, H.P.14
Izmaylov, A.F.15
Bloino, J.16
Zheng, G.17
Sonnenberg, J.L.18
Hada, M.19
Ehara, M.20
Toyota, K.21
Fukuda, R.22
Hasegawa, J.23
Ishida, M.24
Nakajima, T.25
Honda, Y.26
Kitao, O.27
Nakai, H.28
Vreven, T.29
Montgomery, J.A.30
Peralta, J.E.31
Ogliaro, F.32
Bearpark, M.33
Heyd, J.J.34
Brothers, E.35
Kudin, K.N.36
Staroverov, V.N.37
Kobayashi, R.38
Normand, J.39
Raghavachari, K.40
Rendell, A.41
Burant, J.C.42
Iyengar, S.S.43
Tomasi, J.44
Cossi, M.45
Rega, N.46
Millam, N.J.47
Klene, M.48
Knox, J.E.49
Cross, J.B.50
Bakken, V.51
Adamo, C.52
Jaramillo, J.53
Gomperts, R.54
Stratmann, R.E.55
Yazyev, O.56
Austin, A.J.57
Cammi, R.58
Pomelli, C.59
Ochterski, J.W.60
Martin, R.L.61
Morokuma, K.62
Zakrzewski, V.G.63
Voth, G.A.64
Salvador, P.65
Dannenberg, J.J.66
Dapprich, S.67
Daniels, A.D.68
Farkas, O.69
Foresman, J.B.70
Ortiz, J.V.71
Cioslowski, J.72
Fox, D.J.73
more..
-
28
-
-
5544318607
-
Reactions of Triethylaluminum with Electron Donors
-
Takashi, Y. Reactions of Triethylaluminum with Electron Donors Bull. Chem. Soc. Jpn. 1967, 40, 612
-
(1967)
Bull. Chem. Soc. Jpn.
, vol.40
, pp. 612
-
-
Takashi, Y.1
-
29
-
-
84915490681
-
Reaction of organoaluminum with electron donors
-
Pasynkiewicz, S. Reaction of organoaluminum with electron donors Pure Appl. Chem. 1972, 30 (3-4) 509-522
-
(1972)
Pure Appl. Chem.
, vol.30
, Issue.34
, pp. 509-522
-
-
Pasynkiewicz, S.1
|