Proximity injection of plasticizing molecules to self-assembling polymers for large-area, ultrafast nanopatterning in the sub-10-nm regime

ACS Nano

Volumn 7, Issue 8, 2013, Pages 6747-6757

  Jeong, Jae Won ^a   Hur, Yoon Hyung ^a   Kim, Hyeong Jun ^a   Kim, Jong Min ^a   Park, Woon Ik ^a   Kim, Mi Jeong ^b   Kim, Bumjoon J ^a   Jung, Yeon Sik ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

block copolymers; polydimethylsiloxane; polymer gel; self assembly; solvent annealing

Indexed keywords

CONTROLLED ALIGNMENT; FLORY-HUGGINS INTERACTION PARAMETER; NANO-SCALE PATTERNS; POLYMER GELS; SHEAR-INDUCED ALIGNMENT; SOLVENT ANNEALING; SOLVENT-VAPOR ANNEALING; SYSTEMATIC CONTROL;

ALIGNMENT; BLOCK COPOLYMERS; POLYDIMETHYLSILOXANE; SELF ASSEMBLY; SILICONES; SOLVENTS; VAPORS;

POLYMERS;

EID: 84883225766     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn401611z     Document Type: Article

References (59)

1. Park, M.; Harrison, C.; Chaikin, P. M.; Register, R. A.; Adamson, D. H. Block Copolymer Lithography: Periodic Arrays of Similar to 10(11) Holes in 1 Square Centimeter Science 1997, 276, 1401-1404
2. Rockford, L.; Liu, Y.; Mansky, P.; Russell, T. P.; Yoon, M.; Mochrie, S. G. J. Polymers on Nanoperiodic, Heterogeneous Surfaces Phys. Rev. Lett. 1999, 82, 2602-2605
3. Segalman, R. A.; Yokoyama, H.; Kramer, E. J. Graphoepitaxy of Spherical Domain Block Copolymer Films Adv. Mater. 2001, 13, 1152-1155
4. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
5. Cheng, J. Y.; Mayes, A. M.; Ross, C. A. Nanostructure Engineering by Templated Self-Assembly of Block Copolymers Nat. Mater. 2004, 3, 823-828
6. Black, C. T.; Ruiz, R.; Breyta, G.; Cheng, J. Y.; Colburn, M. E.; Guarini, K. W.; Kim, H. C.; Zhang, Y. Polymer Self Assembly in Semiconductor Microelectronics IBM J. Res. Dev. 2007, 51, 605-633
7. Darling, S. B. Directing the Self-Assembly of Block Copolymers Prog. Polym. Sci. 2007, 32, 1152-1204
8. Bita, I.; Yang, J. K.; Jung, Y. S.; Ross, C. A.; Thomas, E. L.; Berggren, K. K. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates Science 2008, 321, 939-943
9. Ruiz, R.; Kang, H. M.; Detcheverry, F. A.; Dobisz, E.; Kercher, D. S.; Albrecht, T. R.; de Pablo, J. J.; Nealey, P. F. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Science 2008, 321, 936-939
10. Park, S.; Lee, D. H.; Xu, J.; Kim, B.; Hong, S. W.; Jeong, U.; Xu, T.; Russell, T. P. Macroscopic 10-Terabit-per-Square-Inch Arrays from Block Copolymers with Lateral Order Science 2009, 323, 1030-1033
11. Yang, J. K. W.; Jung, Y. S.; Chang, J. B.; Mickiewicz, R. A.; Alexander-Katz, A.; Ross, C. A.; Berggren, K. K. Complex Self-Assembled Patterns Using Sparse Commensurate Templates with Locally Varying Motifs Nat. Nanotechnol. 2010, 5, 256-260
12. Tavakkoli, K. G. A.; Gotrik, K. W.; Hannon, A. F.; Alexander-Katz, A.; Ross, C. A.; Berggren, K. K. Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films Science 2012, 336, 1294-1298
13. Bates, C. M.; Seshimo, T.; Maher, M. J.; Durand, W. J.; Cushen, J. D.; Dean, L. M.; Blachut, G.; Ellison, C. J.; Willson, C. G. Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains Science 2012, 338, 775-779
14. Chai, J.; Wang, D.; Fan, X.; Buriak, J. M. Assembly of Aligned Linear Metallic Patterns on Silicon Nat. Nanotechnol. 2007, 2, 500-506
15. Kim, H.-C.; Park, S.-M.; Hinsberg, W. D. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics Chem. Rev. 2009, 110, 146-177
16. Bencher, C.; Yi, H.; Zhou, J.; Cai, M.; Smith, J.; Miao, L.; Montal, O.; Blitshtein, S.; Lavi, A.; Dotan, K. et al. Directed Self-Assembly Defectivity Assessment. Part II Proc. SPIE 2012, 8323, 83230N
17. Liu, C.-C.; Pitera, J.; Lafferty, N.; Lai, K.; Rettner, C.; Tjio, M.; Arellano, N.; Cheng, J. Progress Towards the Integration of Optical Proximity Correction and Directed Self-Assembly of Block Copolymers with Graphoepitaxy Proc. SPIE 2012, 8323, 83230X
18. Tsai, H.-Y.; Miyazoe, H.; Engelmann, S.; To, B.; Sikorski, E.; Bucchignano, J.; Klaus, D.; Liu, C.-C.; Cheng, J.; Sanders, D. et al. Sub-30 nm Pitch Line-Space Patterning of Semiconductor and Dielectric Materials Using Directed Self-Assembly J. Vac. Sci. Technol., B 2012, 30, 06F205
19. Peng, Q.; Tseng, Y.-C.; Darling, S. B.; Elam, J. W. A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates ACS Nano 2011, 5, 4600-4606
20. Leibler, L. Theory of Microphase Separation in Block Copolymers Macromolecules 1980, 13, 1602-1617
21. Bates, F. S.; Fredrickson, G. H. Block Copolymer Thermodynamics: Theory and Experiment Annu. Rev. Phys. Chem. 1990, 41, 525-557
22. Cheng, J. Y.; Sanders, D. P.; Truong, H. D.; Harrer, S.; Friz, A.; Holmes, S.; Colburn, M.; Hinsberg, W. D. Simple and Versatile Methods to Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist ACS Nano 2010, 4, 4815-4823
23. Bencher, C.; Smith, J.; Miao, L.; Cai, C.; Chen, Y.; Cheng, J. Y.; Sanders, D. P.; Tjio, M.; Truong, H. D.; Holmes, S. et al. Self-Assembly Patterning for Sub-15 nm Half-Pitch: A Transition from Lab to Fab Proc. SPIE 2011, 7970, 79700F
24. Somervell, M.; Gronheid, R.; Hooge, J.; Nafus, K.; Rincon Delgadillo, P.; Thode, C.; Younkin, T.; Matsunaga, K.; Rathsack, B.; Scheer, S. et al. Comparison of Directed Self-Assembly Integrations Proc. SPIE 2012, 8325, 83250G
25. Kim, S. H.; Misner, M. J.; Xu, T.; Kimura, M.; Russell, T. P. Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation Adv. Mater. 2004, 16, 226-231
26. Cavicchi, K. A.; Berthiaume, K. J.; Russell, T. P. Solvent Annealing Thin Films of Poly(isoprene- b -lactide) Polymer 2005, 46, 11635-11639
27. Jung, Y. S.; Ross, C. A. Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene-Polydimethylsiloxane Block Copolymer Nano Lett. 2007, 7, 2046-2050
28. Jung, Y. S.; Chang, J. B.; Verploegen, E.; Berggren, K. K.; Ross, C. A. A Path to Ultranarrow Patterns Using Self-Assembled Lithography Nano Lett. 2010, 10, 1000-1005
29. Jeong, J. W.; Park, W. I.; Kim, M. J.; Ross, C. A.; Jung, Y. S. Highly Tunable Self-Assembled Nanostructures from a Poly(2-vinylpyridine- b -dimethylsiloxane) Block Copolymer Nano Lett. 2011, 11, 4095-4101
30. Hirai, T.; Leolukman, M.; Jin, S.; Goseki, R.; Ishida, Y.; Kakimoto, M. A.; Hayakawa, T.; Ree, M.; Gopalan, P. Hierarchical Self-Assembled Structures from Poss-Containing Block Copolymers Synthesized by Living Anionic Polymerization Macromolecules 2009, 42, 8835-8843
31. Hirai, T.; Leolukman, M.; Liu, C. C.; Han, E.; Kim, Y. J.; Ishida, Y.; Hayakawa, T.; Kakimoto, M.; Nealey, P. F.; Gopalan, P. One-Step Direct-Patterning Template Utilizing Self-Assembly of Poss-Containing Block Copolymers Adv. Mater. 2009, 21, 4334-4338
32. Cushen, J. D.; Otsuka, I.; Bates, C. M.; Halila, S.; Fort, S.; Rochas, C.; Easley, J. A.; Rausch, E. L.; Thio, A.; Borsali, R. et al. Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications ACS Nano 2012, 6, 3424-3433
33. Patrone, P. N.; Gallatin, G. M. Modeling Line Edge Roughness in Templated, Lamellar Block Copolymer Systems Macromolecules 2012, 45, 9507-9516
34. Lodge, T. P.; Dalvi, M. C. Mechanisms of Chain Diffusion in Lamellar Block-Copolymers Phys. Rev. Lett. 1995, 75, 657-660
35. Park, W. I.; Kim, K.; Jang, H.-I.; Jeong, J. W.; Kim, J. M.; Choi, J.; Park, J. H.; Jung, Y. S. Directed Self-Assembly with Sub-100 Degrees Celsius Processing Temperature, Sub-10 Nanometer Resolution, and Sub-1 minute Assembly Time Small 2012, 8, 3762-3768
36. Gotrik, K. W.; Hannon, A. F.; Son, J. G.; Keller, B.; Alexander-Katz, A.; Ross, C. A. Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors ACS Nano 2012, 6, 8052-8059
37. Bang, J.; Kim, S. H.; Drockenmuller, E.; Misner, M. J.; Russell, T. P.; Hawker, C. J. Defect-Free Nanoporous Thin Films from ABC Triblock Copolymers J. Am. Chem. Soc. 2006, 128, 7622-7629
38. Jung, Y. S.; Ross, C. A. Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns Adv. Mater. 2009, 21, 2540-2545
39. Zhang, X.; Harris, K. D.; Wu, N. L.; Murphy, J. N.; Buriak, J. M. Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing ACS Nano 2010, 4, 7021-7029
40. Paik, M. Y.; Bosworth, J. K.; Smilges, D.-M.; Schwartz, E. L.; Andre, X.; Ober, C. K. Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An in-Situ GISAXS Study Macromolecules 2010, 43, 4253-4260
41. Elbs, H.; Krausch, G. Ellipsometric Determination of Flory-Huggins Interaction Parameters in Solution Polymer 2004, 45, 7935-7942
42. Bang, J.; Kim, B. J.; Stein, G. E.; Russell, T. P.; Li, X.; Wang, J.; Kramer, E. J.; Hawker, C. J. Effect of Humidity on the Ordering of PEO-Based Copolymer Thin Films Macromolecules 2007, 40, 7019-7025
43. Zettl, U.; Knoll, A.; Tsarkova, L. Effect of Confinement on the Mesoscale and Macroscopic Swelling of Thin Block Copolymer Films Langmuir 2009, 26, 6610-6617
44. Qiao, C. D.; Cao, X. L.; Wang, F. Swelling Behavior Study of Physically Crosslinked Gelatin Hydrogels Polym. Polym. Compos. 2012, 20, 53-57
45. Gandelsman, M. I.; Budtov, V. P. On the Equilibrium Swelling of Polymer Networks in Good Solvents Vysokomol. Soedin. Ser. B 1988, 30, 825-829
46. Allen, G.; Egerton, P.; Walsh, D. The Vapour Pressure of Solvent above Swollen Polymer Netwokrs in Relation to Rubber Elasticity Theory Eur. Polym. J. 1979, 15, 983-986
47. Gusler, G. M.; Cohen, Y. Equilibrium Swelling of Highly Cross-Linked Polymeric Resins Ind. Eng. Chem. Res. 1994, 33, 2345-2357
48. Jung, Y. S.; Jung, W.; Tuller, H. L.; Ross, C. A. Nanowire Conductive Polymer Gas Sensor Patterned Using Self-Assembled Block Copolymer Lithography Nano Lett. 2008, 8, 3776-3780
49. Jeong, J. W.; Park, W. I.; Do, L.-M.; Park, J.-H.; Kim, T.-H.; Chae, G.; Jung, Y. S. Nanotransfer Printing with Sub-10 nm Resolution Realized Using Directed Self-Assembly Adv. Mater. 2012, 24, 3526-3531
50. Park, W. I.; Yoon, J. M.; Park, M.; Lee, J.; Kim, S. K.; Jeong, J. W.; Kim, K.; Jeong, H. Y.; Jeon, S.; No, K. S. et al. Self-Assembly-Induced Formation of High-Density Silicon Oxide Memristor Nanostructures on Graphene and Metal Electrodes Nano Lett. 2012, 12, 1235-1240
51. Masaro, L.; Zhu, X. X. Physical Models of Diffusion for Polymer Solutions, Gels and Solids Prog. Polym. Sci. 1999, 24, 731-775
52. Grinsted, R. A.; Clark, L.; Koenig, J. L. Study of Cyclic Sorption-Desorption into Poly(methylmethacrylate) Rods Using NMR Imaging Macromolecules 1992, 25, 1235-1241
53. Lide, D. R. CRC Handbook of Chemistry and Physics, 88 th ed. (Internet Version 2008); CRC Press: Boca Raton, FL, 2008.
54. Andrade, J. D. Hydrogels for Medical and Related Applications; American Chemical Society: Washington, DC, 1976.
55. Mendoza, C.; Pietsch, T.; Gindy, N.; Fahmi, A. Fabrication of 3D-Periodic Ordered Metallic Nanoparticles in a Block Copolymer Bulk Matrix via Oscillating Shear Flow Adv. Mater. 2008, 20, 1179-1184
56. Angelescu, D. E.; Waller, J. H.; Adamson, D. H.; Deshpande, P.; Chou, S. Y.; Register, R. A.; Chaikin, P. M. Macroscopic Orientation of Block Copolymer Cylinders in Single-Layer Films by Shearing Adv. Mater. 2004, 16, 1736-1740
57. Angelescu, D. E.; Waller, J. H.; Register, R. A.; Chaikin, P. M. Shear-Induced Alignment in Thin Films of Spherical Nanodomains Adv. Mater. 2005, 17, 1878-1881
58. Li, G.; Yao, Y.; Yang, H.; Shrotriya, V.; Yang, G.; Yang, Y. "Solvent Annealing" Effect in Polymer Solar Cells Based on Poly(3-hexylthiophene) and Methanofullerenes Adv. Funct. Mater. 2007, 17, 1636-1644
59. Gao, B.; Arya, G.; Tao, A. R. Self-Orienting Nanocubes for the Assembly of Plasmonic Nanojunctions Nat. Nanotechnol. 2012, 7, 433-437