Directed Self-Assembly of Diblock Copolymer Thin Films on Chemically-Patterned Substrates for Defect-Free Nano-Patterning

Macromolecules

Volumn 41, Issue 23, 2008, Pages 9267-9276

  Tada, Yasuhiko ^a   Akasaka, Satoshi ^b   Yoshida, Hiroshi ^a   Hasegawa, Hirokazu ^b   Dobisz, Elizabeth ^c   Kercher, Dan ^c   Takenaka, Mikihito ^b  

^a HITACHI LTD   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c HITACHI AMERICA LTD   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDRICAL MICRODOMAIN; DIBLOCK COPOLYMER THIN FILMS; DIBLOCK COPOLYMERS; DIRECTED SELF ASSEMBLIES; DOMAIN STRUCTURES; EB LITHOGRAPHIES; EPITAXIALLY GROWN; FABRICATION METHODS; HEXAGONAL LATTICES; HIGH DENSITIES; IN-BETWEEN; NANO PATTERNS; NANO-PATTERNING; PATTERN DENSITIES; PATTERN POSITIONS; PATTERNED SUBSTRATES; POLIES (METHYLMETHACRYLATE); SELF- ASSEMBLIES; SELF-ASSEMBLE; SELF-ASSEMBLY PROCESS; TOP DOWNS; WELL-ALIGNED;

BLOCK COPOLYMERS; COPOLYMERIZATION; DEFECTS; ELECTRON BEAMS; ESTERS; POLYMERS; POLYSTYRENES; SELF ASSEMBLY;

SUBSTRATES;

EID: 64549083174     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma801542y     Document Type: Article

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