Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates

ACS Nano

Volumn 6, Issue 6, 2012, Pages 5440-5448

  Ji, Shengxiang ^a   Nagpal, Umang ^b   Liu, Guoliang ^b   Delcambre, Sean P ^b   Müller, Marcus ^c   De Pablo, Juan J ^b   Nealey, Paul F ^b  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

^b University of Wisconsin Madison   (United States)

^c UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

block copolymer lithography; directed assembly; simulation; thin film; triblock copolymer

Indexed keywords

AB DIBLOCK COPOLYMERS; ABA TRIBLOCK COPOLYMER; ASSEMBLY KINETICS; BLOCK COPOLYMER LITHOGRAPHY; CHEMICAL PATTERN; DIBLOCKS; DIRECTED ASSEMBLY; EQUILIBRIUM STATE; EXPERIMENTAL OBSERVATION; METASTABLE STRUCTURES; NANOPATTERNED SUBSTRATES; NANOPATTERNED SURFACES; NON EQUILIBRIUM; ORDERS OF MAGNITUDE; SIMULATION; THERMO DYNAMIC ANALYSIS; TRIBLOCKS;

ESTERS; LITHOGRAPHY; METASTABLE PHASES; MORPHOLOGY; STYRENE; THERMOANALYSIS; THIN FILMS;

BLOCK COPOLYMERS;

NANOPARTICLE; POLY(METHYL METHACRYLATE); POLYSTYRENE DERIVATIVE;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; MOLECULAR IMPRINTING; NANOPARTICLES; PARTICLE SIZE; POLYMETHYL METHACRYLATE; POLYSTYRENES; SURFACE PROPERTIES;

EID: 84862856418     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn301306v     Document Type: Article

References (59)

1. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
2. Edwards, E. W.; Montague, M. F.; Solak, H. H.; Hawker, C. J.; Nealey, P. F. Precise Control over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates Adv. Mater. 2004, 16, 1315-1319
3. Edwards, E. W.; Stoykovich, M. P.; Muller, M.; Solak, H. H.; de Pablo, J. J.; Nealey, P. F. Mechanism and Kinetics of Ordering in Diblock Copolymer Thin Films on Chemically Nanopatterned Substrates J. Polym. Sci., Part B: Polym. Phys. 2005, 43, 3444-3459
4. Edwards, E. W.; Muller, M.; Stoykovich, M. P.; Solak, H. H.; de Pablo, J. J.; Nealey, P. F. Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates Macromolecules 2007, 40, 90-96
5. Welander, A. M.; Kang, H. M.; Stuen, K. O.; Solak, H. H.; Muller, M.; de Pablo, J. J.; Nealey, P. F. Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures Macromolecules 2008, 41, 2759-2761
6. Stoykovich, M. P.; Muller, M.; Kim, S. O.; Solak, H. H.; Edwards, E. W.; de Pablo, J. J.; Nealey, P. F. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures Science 2005, 308, 1442-1446
7. Kang, H.; Craig, G. S. W.; Nealey, P. F. Directed Assembly of Asymmetric Ternary Block Copolymer-Homopolymer Blends Using Symmetric Block Copolymer into Checkerboard Trimming Chemical Pattern J. Vac. Sci. Technol., B 2008, 26, 2495-2499
8. Kang, H.; Detcheverry, F. A.; Mangham, A. N.; Stoykovich, M. P.; Daoulas, K. C.; Hamers, R. J.; Muller, M.; de Pablo, J. J.; Nealey, P. F. Hierarchical Assembly of Nanoparticle Superstructures from Block Copolymer-Nanoparticle Composites Phys. Rev. Lett. 2008, 100, 148303
9. Stoykovich, M. P.; Kang, H.; Daoulas, K. C.; Liu, G.; Liu, C. C.; de Pablo, J. J.; Mueller, M.; Nealey, P. F. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries ACS Nano 2007, 1, 168-175
10. Ruiz, R.; Dobisz, E.; Albrecht, T. R. Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media ACS Nano 2011, 5, 79-84
11. Ji, S. X.; Liu, C. C.; Liu, G. L.; Nealey, P. F. Molecular Transfer Printing Using Block Copolymers ACS Nano 2010, 4, 599-609
12. Liu, G. L.; Thomas, C. S.; Craig, G. S. W.; Nealey, P. F. Integration of Density Multiplication in the Formation of Device-Oriented Structures by Directed Assembly of Block Copolymer-Homopolymer Blends Adv. Funct. Mater. 2010, 20, 1251-1257
13. Ji, S. X.; Nagpal, U.; Liao, W.; Liu, C.-C.; de Pablo, J. J.; Nealey, P. F. Three-Dimensional Directed Assembly of Block Copolymers Together with Two-Dimensional Square and Rectangular Nanolithography Adv. Mater. 2011, 23, 3692-3697
14. Liu, C. C.; Han, E.; Onses, M. S.; Thode, C. J.; Ji, S. X.; Gopalan, P.; Nealey, P. F. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats Macromolecules 2011, 44, 1876-1885
15. Ruiz, R.; Kang, H. M.; Detcheverry, F. A.; Dobisz, E.; Kercher, D. S.; Albrecht, T. R.; de Pablo, J. J.; Nealey, P. F. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Science 2008, 321, 936-939
16. Bita, I.; Yang, J. K. W.; Jung, Y. S.; Ross, C. A.; Thomas, E. L.; Berggren, K. K. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates Science 2008, 321, 939-943
17. Cheng, J. Y.; Rettner, C. T.; Sanders, D. P.; Kim, H. C.; Hinsberg, W. D. Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers Adv. Mater. 2008, 20, 3155-3158
18. Tada, Y.; Akasaka, S.; Takenaka, M.; Yoshida, H.; Ruiz, R.; Dobisz, E.; Hasegawa, H. Nine-Fold Density Multiplication of HCP Lattice Pattern by Directed Self-Assembly of Block Copolymer Polymer 2009, 50, 4250-4256
19. 2 Patterned Media Adv. Mater. 2009, 21, 2516-2519
20. 2 and Beyond ACS Nano 2009, 3, 1844-1858
21. Hellwig, O.; Bosworth, J. K.; Dobisz, E.; Kercher, D.; Hauet, T.; Zeltzer, G.; Risner-Jamtgaard, J. D.; Yaney, D.; Ruiz, R. Bit Patterned Media Based on Block Copolymer Directed Assembly with Narrow Magnetic Switching Field Distribution Appl. Phys. Lett. 2010, 96, 052511
22. Yang, X. M.; Xu, Y.; Lee, K.; Xiao, S. G.; Ku, D.; Weller, D. Advanced Lithography for Bit Patterned Media IEEE Trans. Magn. 2009, 45, 833-838
23. Albrecht, T. R.; Hellwing, O.; Ruiz, R.; Schabes, M. E.; Terris, B. D.; Wu, X. Z. Bit-Patterned Magnetic Recording: Nanoscale Magnetic Islands for Data Storage. Nanoscale Magnetic Materials and Applications; Springer: Berlin, 2009; pp 237-274.
24. Black, C. T.; Ruiz, R.; Breyta, G.; Cheng, J. Y.; Colburn, M. E.; Guarini, K. W.; Kim, H. C.; Zhang, Y. Polymer Self Assembly in Semiconductor Microelectronics IBM J. Res. Dev. 2007, 51, 605-633
25. Park, S. M.; Ravindran, P.; La, Y. H.; Craig, G. S. W.; Ferrier, N. J.; Nealey, P. F. Combinatorial Generation and Replication-Directed Assembly of Complex and Varied Geometries with Thin Films of Diblock Copolymers Langmuir 2007, 23, 9037-9045
26. Dejeu, W. H.; Lambooy, P.; Hamley, I. W.; Vaknin, D.; Pedersen, J. S.; Kjaer, K.; Seyger, R.; Vanhutten, P.; Hadziioannou, G. On the Morphology of a Lamellar Triblock Copolymer Film J. Phys. II 1993, 3, 139-146
27. Matsen, M. W. Bridging and Looping in Multiblock Copolymer Melts J. Chem. Phys. 1995, 102, 3884-3887
28. Matsen, M. W.; Schick, M. Lamellar Phase of a Symmetrical Triblock Copolymer Macromolecules 1994, 27, 187-192
29. Matsen, M. W.; Thompson, R. B. Equilibrium Behavior of Symmetric ABA Triblock Copolymer Melts J. Chem. Phys. 1999, 111, 7139-7164
30. Mayes, A. M.; Delacruz, M. O. Microphase Separation in Multiblock Copolymer Melts J. Chem. Phys. 1989, 91, 7228-7235
31. Milner, S. T. Chain Architecture and Asymmetry in Copolymer Microphases Macromolecules 1994, 27, 2333-2335
32. Gehlsen, M. D.; Almdal, K.; Bates, F. S. Order-Disorder Transition-Diblock versus Triblock Copolymers Macromolecules 1992, 25, 939-943
33. Mai, S. M.; Mingvanish, W.; Turner, S. C.; Chaibundit, C.; Fairclough, J. P. A.; Heatley, F.; Matsen, M. W.; Ryan, A. J.; Booth, C. Microphase-Separation Behavior of Triblock Copolymer Melts. Comparison with Diblock Copolymer Melts Macromolecules 2000, 33, 5124-5130
34. Watanabe, H. Slow Dielectric-Relaxation of a Styrene-Isoprene-Styrene Triblock Copolymer with Dipole Inversion in the Middle Block-A Challenge to a Loop-Bridge Problem Macromolecules 1995, 28, 5006-5011
35. Helfand, E.; Wasserman, Z. R. Block Copolymer Theory 0.4. Narrow Interphase Approximation Macromolecules 1976, 9, 879-888
36. Leibler, L. Theory of Microphase Separation in Block Co-polymers Macromolecules 1980, 13, 1602-1617
37. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. J. Controlling Polymer-Surface Interactions with Random Copolymer Brushes Science 1997, 275, 1458-1460
38. Ryu, D. Y.; Shin, K.; Drockenmuller, E.; Hawker, C. J.; Russell, T. P. A Generalized Approach to the Modification of Solid Surfaces Science 2005, 308, 236-239
39. In, I.; La, Y. H.; Park, S. M.; Nealey, P. F.; Gopalan, P. Side-Chain-Grafted Random Copolymer Brushes as Neutral Surfaces for Controlling the Orientation of Block Copolymer Microdomains in Thin Films Langmuir 2006, 22, 7855-7860
40. Ji, S.; Liu, C. C.; Son, J. G.; Gotrik, K.; Craig, G. S. W.; Gopalan, P.; Himpsel, F. J.; Char, K.; Nealey, P. F. Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films Macromolecules 2008, 41, 9098-9103
41. Ji, S. X.; Liu, G. L.; Zheng, F.; Craig, G. S. W.; Himpsel, F. J.; Nealey, P. F. Preparation of Neutral Wetting Brushes for Block Copolymer Films from Homopolymer Blends Adv. Mater. 2008, 20, 3054-3060
42. Han, E.; Stuen, K. O.; La, Y. H.; Nealey, P. F.; Gopalan, P. Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains Macromolecules 2008, 41, 9090-9097
43. Bates, C. M.; Strahan, J. R.; Santos, L. J.; Mueller, B. K.; Bamgbade, B. O.; Lee, J. A.; Katzenstein, J. M.; Ellison, C. J.; Willson, C. G. Polymeric Cross-Linked Surface Treatments for Controlling Block Copolymer Orientation in Thin Films Langmuir 2011, 27, 2000-2006
44. Ji, S. X.; Liao, W.; Nealey, P. F. Block Cooligomers: A Generalized Approach to Controlling the Wetting Behavior of Block Copolymer Thin Films Macromolecules 2010, 43, 6919-6922
45. Ji, S. X.; Liu, C. C.; Liao, W.; Fenske, A. L.; Craig, G. S. W.; Nealey, P. F. Domain Orientation and Grain Coarsening in Cylinder-Forming Poly(styrene- b -methyl methacrylate) Films Macromolecules 2011, 44, 4291-4300
46. Wu, L. F.; Cochran, E. W.; Lodge, T. P.; Bates, F. S. Consequences of Block Number on the Order-Disorder Transition and Viscoelastic Properties of Linear (AB)(n) Multiblock Copolymers Macromolecules 2004, 37, 3360-3368
47. Daoulas, K. C.; Muller, M.; Stoykovich, M. P.; Kang, H.; de Pablo, J. J.; Nealey, P. F. Directed Copolymer Assembly on Chemical Substrate Patterns: A Phenomenological and Single-Chain-in-Mean-Field Simulations Study of the Influence of Roughness in the Substrate Pattern Langmuir 2008, 24, 1284-1295
48. Daoulas, K. C.; Muller, M.; Stoykovich, M. P.; Papakonstantopoulos, Y. J.; de Pablo, J. J.; Nealey, P. F.; Park, S. M.; Solak, H. H. Directed Assembly of Copolymer Materials on Patterned Substrates: Balance of Simple Symmetries in Complex Structures J. Polym. Sci., Part B: Polym. Phys. 2006, 44, 2589-2564
49. Detcheverry, F. A.; Pike, D. Q.; Nagpal, U.; Nealey, P. F.; de Pablo, J. J. Theoretically Informed Coarse Grain Simulations of Block Copolymer Melts: Method and Applications Soft Matter 2009, 5, 4858-4865
50. Detcheverry, F. A.; Pike, D. Q.; Nealey, P. F.; Muller, M.; de Pablo, J. J. Monte Carlo Simulation of Coarse Grain Polymeric Systems Phys. Rev. Lett. 2009, 102, 197801
51. Lipowsky, R.; Dobereiner, H. G.; Hiergeist, C.; Indrani, V. Membrane Curvature Induced by Polymers and Colloids Physica A 1998, 249, 536-543
52. Stoykovich, M. P.; Edwards, E. W.; Solak, H. H.; Nealey, P. F. Phase Behavior of Symmetric Ternary Block Copolymer-Homopolymer Blends in Thin Films and on Chemically Patterned Surfaces Phys. Rev. Lett. 2006, 97, 147802
53. Thompson, R. B.; Rasmussen, K. O.; Lookman, T. Elastic Moduli of Multiblock Copolymers in the Lamellar Phase J. Chem. Phys. 2004, 120, 3990-3996
54. Daoulas, K. C.; Muller, M. Single Chain in Mean Field Simulations: Quasi-instantaneous Field Approximation and Quantitative Comparison with Monte Carlo Simulations J. Chem. Phys. 2006, 125, 184904
55. Soga, K. G.; Zuckermann, M. J.; Guo, H. Binary Polymer Brush in a Solvent Macromolecules 1996, 29, 1998-2005
56. Pike, D. Q.; Detcheverry, F. A.; Muller, M.; de Pablo, J. J. Theoretically Informed Coarse Grain Simulations of Polymeric Systems J. Chem. Phys. 2009, 131, 084903
57. Detcheverry, F. A.; Liu, G. L.; Nealey, P. F.; de Pablo, J. J. Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments Macromolecules 2010, 43, 3446-3454
58. Muller, M.; Daoulas, K. C. Calculating the Free Energy of Self-Assembled Structures by Thermodynamic Integration J. Chem. Phys. 2008, 128, 024903
59. Muller, M.; Daoulas, K. C.; Norizoe, Y. Computing Free Energies of Interfaces in Self-Assembling Systems Phys. Chem. Chem. Phys. 2009, 11, 2087-2097