Nanostructure engineering by templated self-assembly of block copolymers

Nature Materials

Volumn 3, Issue 11, 2004, Pages 823-828

  Cheng, Joy Y ^a   Mayes, Anne M ^a   Ross, Caroline A ^a  

^a USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; DISLOCATIONS (CRYSTALS); NANOTECHNOLOGY; RELAXATION PROCESSES; SELF ASSEMBLY; SEMICONDUCTOR QUANTUM DOTS; STRAIN; SUBSTRATES; THIN FILMS;

MAGNETIC MEDIA; NANOFABRICATION TECHNOLOGY; SPATIAL ARRANGEMENTS;

NANOSTRUCTURED MATERIALS;

POLYMER;

ARTICLE; CHEMISTRY; NANOTECHNOLOGY;

NANOTECHNOLOGY; POLYMERS;

EID: 8344275974     PISSN: 14761122     EISSN: None     Source Type: Journal    
DOI: 10.1038/nmat1211     Document Type: Article

References (34)

1. 11 holes in 1 square centimeter. Science 276, 1401-1404 (1997).
2. Thurn-Albrecht, T. et al. Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates. Science 290, 2126-2129 (2000).
3. Cheng, J. Y. et al. Formation of a magnetic dot array via block copolymer lithography. Adv. Mater. 13, 1174-1178 (2001).
4. Spatz, I. P., Herzog, T., Mobmer, S., Ziemann, P. & Moller, M. Micellar inorganic-polymer hybrid systems- a tool for nanolithography. Adv. Mater. 11, 149-153 (1999).
5. Black, C. T. et al. Integration of self-assembled block copolymers for semiconductor capacitor fabrication. Appl. Phys. Lett. 79, 409-411 (2001).
6. Guarini K. W. et al. Low voltage, scalable nanocrystal flash memory fabricated by templated self assembly. IEEE Electron Devices Mtg Tech. Digest, 541-542 (2003).
7. Ross, C. A. Patterned magnetic recording media. Annu. Rev. Mater. Res. 31, 203-235 (2001).
8. Maier, S. A. et al. Plasmonics - a route to nanoscale optical devices. Adv. Mater. 13, 1501-1505 (2001).
9. Morkved, T. L. et al. Local control of microdomain orientation in diblock copolymer thin films with electric fields. Science 273, 931-933 (1996).
10. De Rosa, C., Park, C., Thomas, E. L. & Lotz, B. Microdomain patterns from directional eutectic solidification and epitaxy. Nature 405, 433-437 (2000).
11. Segalman, R., Yokoyama, H. & Kramer, E. J. Graphoepitaxy of spherical block copolymer films. Adv. Mater. 13, 1152-1155 (2001).
12. Cheng, J. Y., Ross, C. A., Thomas, E. L., Smith, H. I. & Vancso, G. J. Fabrication of nanostructures with long-range order using block copolymer lithography. Appl. Phys. Lett. 81, 3657-3659 (2002).
13. Cheng, J. Y., Ross, C. A., Thomas, E. L., Smith, H. I. & Vancso, G. J. Templated self-assembly of block copolymers: Effect of substrate topography. Adv. Mater. 15, 1599-1602 (2003).
14. Naito, K., Hieda, H., Sakurai, M., Kamata, Y. & Asakawa, K. 2.5-inch disk patterned media prepared by an artificially assisted self-assembling method. IEEE Trans. Magn. 38, 1949-1951 (2002).
15. Fasolka, M. J. & Mayes, A. M. Block copolymer thin films: physics and applications. Annu. Rev. Mater. Res. 31, 323-355 (2001).
16. Fasolka, M. J., Harris, D. J., Mayes, A. M., Yoon, M. & Mochrie, S. G. J. Observed substrate topography-mediated lateral patterning of diblock copolymer film. Phys. Rev. Lett. 79, 3018-3021 (1997).
17. Rockford, L., Liu, Y., Mansky, P. & Russell, T. P. Polymers on nanoperiodic, heterogeneous surfaces. Phys. Rev. Lett. 82, 2602-2605 (1999).
18. Kim, S. O. et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. Nature 424, 411-414 (2003).
19. Segalman, R. A., Hexemer, A., Hayward, R. C. & Kramer, E. J. Ordering and melting of block copolymer spherical domains in 2 and 3 dimensions, Macromolecules 36, 3272-3288 (2003).
20. Segalman, R. A., Hexemer, A. & Kramer, E. J. Effects of lateral confinement on order in spherical block copolymer thin films. Macromolecules 36, 6831-6839 (2003).
21. Matthews, J. W. in Epitaxial Growth (ed. Matthews, J. W.) (Academic, New York, 1975).
22. Manners, I. Poly(ferrocenylsilanes): novel organometallic plastics. Chem. Commun. 10, 857-865 (1999).
23. Lammertink, R. G. H., Hempenius, M. A., Chan, V. Z.-H., Thomas, E. L. & Vancso, G. J. Poly(ferrocenyldimethylsilanes) for reactive ion etch barrier applications. Chem. Mater. 13, 429-434 (2001).
24. Eitouni, H. B., Balsara, N. P., Hahn, H., Pople, J. A. & Hempenius, M. A. Thermodynamic interactions in organometallic block copolymers: poly(styrene-block-ferrocenyldimethylsilane). Macromolecules 35, 7765-7772 (2002).
25. Lammertink, R. G. H., Hempenius, M. A., Thomas, E. L. & Vancso, G. J. Periodic organic-organometallic microdomain structures in poly(styrene-block- ferrocenyl-dimethylsilane) copolymers and blends with corresponding homopolymers. J. Polym. Sci. Part B: Polym. Phys. 37, 1009-1021 (1999).
26. Turner, M. S. Equilibrium properties of a diblock copolymer lamellar phase confined between flat plates. Phys. Rev. Lett. 69, 1788-1791 (1992).
27. Walton, D. G., Kellogg, G. J., Mayes, A. M., Lambooy, P. & Russell, T. P. A free-energy model for confined block copolymers. Macromolecules 27, 6225-6228 (1994).
28. Abetz, V., Stadler, R. & Leibler, L. Order-disorder and order-order transitions in AB and ABC block copolymers: description by a simple model. Polym. Bull. 37, 135-142 (1996).
29. Stadler, R., Auschra, C., Beckmann, J., Krappe, U., Voigt-Martin, I. & Leibler, L. Morphology and thermodynamics of symmetric poly(A-block-B-blocl-C) triblock copolymers. Macromolecules 28, 3080-3097 (1995).
30. Pereira, G. G. Confinement of columnar diblock copolymers: simulations, theory and applications. Euro. Phys. J. E 7, 273-289 (2002).
31. Matsen, M. W. Cylinder↔sphere epitaxial transitions in block copolymer melts. J. Phys. Chem. 114, 8165-8173 (2001).
32. Matsen, M. W. Cylinder↔gyroid epitaxial transitions in complex polymeric liquids. Phys. Rev. Lett. 80, 4470-4473 (1998).
33. Kumacheva, E., Golding, R. K., Allard, M. & Sargent, E. H. Colloid crystal growth on mesoscopically patterned surfaces: Effect of confinement. Adv. Mater. 14, 221-224 (2002).
34. Kumacheva, E., Garstecki, P., Wu, H. & Whitesides, G. M. Two-dimensional colloid crystals obtained by coupling of flow and confinement. Phys. Rev. Lett. 91, 128301 (2003).