Deep Reactive Ion Etching

Handbook of Silicon Based MEMS Materials and Technologies

Volumn , Issue , 2010, Pages 349-374

  Laermer, Franz ^a   Franssila, Sami ^b   Sainiemi, Lauri ^b   Kolari, Kai ^c  

^a ROBERT BOSCH GMBH   (Germany)

^b AALTO UNIVERSITY   (Finland)

^c VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 80052270155     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-0-8155-1594-4.00023-1     Document Type: Chapter

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