SU8 resist plasma etching and its optimisation

DTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003

Volumn , Issue , 2003, Pages 268-271

  Hong, Guodong ^a   Holmes, A S ^a   Heaton, M E ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

Dielectric devices; Etching; Mechanical factors; Plasma applications; Plasma devices; Plasma properties; Polymers; Resins; Resists; Water

Indexed keywords

EID: 84945911066     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/DTIP.2003.1287050     Document Type: Conference Paper

References (12)

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