Micromachining of buried micro channels in silicon

Journal of Microelectromechanical Systems

Volumn 9, Issue 1, 2000, Pages 94-103

  De Boer, Meint J ^a   Tjerkstra, R Willem ^b   Berenschot, J W ^a   Jansen, Henri V ^c   Burger, G J ^d   Gardeniers, J G E ^a   Elwenspoek, Miko ^a   Van Den Berg, Albert ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

^c IMEC   (Belgium)

^d PO Box 318 7500 AH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL FLOW; DEPOSITION; MICROMACHINING; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SURFACES;

BURIED CHANNEL TECHNOLOGY; LAB ON A CHIP; MICROCHANNELS; MICROFLUIDICS; SILICON MICROMACHINING; TRENCH ETCHING;

MICROELECTROMECHANICAL DEVICES;

EID: 0033891780     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.825783     Document Type: Article

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