Atomic layer deposition enhanced rapid dry fabrication of micromechanical devices with cryogenic deep reactive ion etching

Journal of Micromechanics and Microengineering

Volumn 17, Issue 8, 2007, Pages 1731-1736

  Chekurov, N ^a   Koskenvuori, M ^a   Airaksinen, V M ^a   Tittonen, I ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; LOW TEMPERATURE PHENOMENA; MICROFABRICATION; MICROMACHINING; REACTIVE ION ETCHING;

DEEP REACTIVE ION ETCHING; DRY MICROFABRICATION PROCESSES; LIMITING FACTORS; SILICON MICROMACHINING;

MEMS;

EID: 34547674890     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/8/041     Document Type: Article

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