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Volumn 144, Issue 9, 1997, Pages 3188-3191

Wet refinement of dry etched trenches in silicon

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; AMMONIUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CHLORINE; CHLORINE COMPOUNDS; DRY ETCHING; FLUORINE COMPOUNDS; NITROGEN; PLASMAS; REACTIVE ION ETCHING; SINGLE CRYSTALS;

EID: 0031233514     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837981     Document Type: Article
Times cited : (6)

References (12)
  • 1
    • 5244221721 scopus 로고    scopus 로고
    • U.S. Pat. 4,139,442 (1979)
    • J. A. Bondur and H. B. Pogge, U.S. Pat. 4,139,442 (1979).
    • Bondur, J.A.1    Pogge, H.B.2
  • 12
    • 5244265701 scopus 로고    scopus 로고
    • Unpublished data
    • A. Torkkeli, Unpublished data.
    • Torkkeli, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.