|
Volumn 144, Issue 9, 1997, Pages 3188-3191
|
Wet refinement of dry etched trenches in silicon
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ADDITIVES;
AMMONIUM COMPOUNDS;
CHEMICAL VAPOR DEPOSITION;
CHLORINE;
CHLORINE COMPOUNDS;
DRY ETCHING;
FLUORINE COMPOUNDS;
NITROGEN;
PLASMAS;
REACTIVE ION ETCHING;
SINGLE CRYSTALS;
BORON TRICHLORIDE;
CHLOROFORM;
DRY ETCHED TRENCHES;
SULFUR HEXAFLUORIDE;
TETRAMETHYL AMMONIUM HYDROXIDE;
SILICON WAFERS;
|
EID: 0031233514
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1837981 Document Type: Article |
Times cited : (6)
|
References (12)
|