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Volumn 13, Issue 4, 2003, Pages

Micro pinball game demonstrating an easy MEMS transfer process using room temperature plasma bonding

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTROSTATICS; MICROMACHINING; PLASMA APPLICATIONS;

EID: 0037765115     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/13/4/308     Document Type: Conference Paper
Times cited : (8)

References (19)
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    • Fabrication of SOI wafers with buried cavities using silicon fusion bonding and electrochemical etchback
    • Noworolski J M, Klaassen E, Logan J, Petersen K and Maluf N I 1996 Fabrication of SOI wafers with buried cavities using silicon fusion bonding and electrochemical etchback Sensors Actuators A 54 709-13
    • (1996) Sensors Actuators A , vol.54 , pp. 709-713
    • Noworolski, J.M.1    Klaassen, E.2    Logan, J.3    Petersen, K.4    Maluf, N.I.5
  • 6
    • 0034468212 scopus 로고    scopus 로고
    • Fabrication of silicon and oxide membranes over cavities using ion-cut layer transfer
    • Yun C H and Cheung N W 2000 Fabrication of silicon and oxide membranes over cavities using ion-cut layer transfer J. Microelectromech. Syst. 9 474-7
    • (2000) J. Microelectromech. Syst. , vol.9 , pp. 474-477
    • Yun, C.H.1    Cheung, N.W.2
  • 8
    • 0033904174 scopus 로고    scopus 로고
    • Localized silicon fusion and eutectic bonding for MEMS fabrication and packaging
    • Cheng Y T and Lin L 2000 Localized silicon fusion and eutectic bonding for MEMS fabrication and packaging J. Microelectromech. Syst. 9 3-8
    • (2000) J. Microelectromech. Syst. , vol.9 , pp. 3-8
    • Cheng, Y.T.1    Lin, L.2
  • 11
    • 0036851992 scopus 로고    scopus 로고
    • Double-sided bulk micromachining of silicon-on-insulator films using room-temperature oxygen plasma assisted bonding
    • Sanz-Velasco A, Rödjegård H and Andersson G I 2002 Double-sided bulk micromachining of silicon-on-insulator films using room-temperature oxygen plasma assisted bonding J. Micromech. Microeng. 12 786-94
    • (2002) J. Micromech. Microeng. , vol.12 , pp. 786-794
    • Sanz-Velasco, A.1    Rödjegård, H.2    Andersson, G.I.3
  • 14
    • 0022914969 scopus 로고
    • Mechanism of silicon surface roughening by reactive ion etching
    • Oehrlein G S, Schad R G and Jaso M A 1986 Mechanism of silicon surface roughening by reactive ion etching Surf. Interface Anal. 8 243-6
    • (1986) Surf. Interface Anal. , vol.8 , pp. 243-246
    • Oehrlein, G.S.1    Schad, R.G.2    Jaso, M.A.3
  • 17
    • 0034275514 scopus 로고    scopus 로고
    • Micro-discharge and electric breakdown in a micro-gap
    • Ono T, Sim D Y and Esashi M 2000 Micro-discharge and electric breakdown in a micro-gap J. Micromech. Microeng. 10 445-51
    • (2000) J. Micromech. Microeng. , vol.10 , pp. 445-451
    • Ono, T.1    Sim, D.Y.2    Esashi, M.3
  • 19
    • 0037238656 scopus 로고    scopus 로고
    • Materials selection for microfabricated electrostatic actuators
    • Srikar V T and Spearing S M 2003 Materials selection for microfabricated electrostatic actuators Sensors Actuators A 102 279-85
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    • Srikar, V.T.1    Spearing, S.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.