Etching materials with an atmospheric-pressure plasma jet

Plasma Sources Science and Technology

Volumn 7, Issue 3, 1998, Pages 282-285

  Jeong, J Y ^a   Babayan, S E ^a   Tu, V J ^a   Park, J ^b   Henins, I ^a   Hicks, R F ^a   Selwyn, G S ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; ELECTRIC DISCHARGES; ELECTRODES; EMISSION SPECTROSCOPY; HELIUM; NOZZLES; OXYGEN; PLASMA ETCHING; SILICA; TANTALUM; TUNGSTEN;

CARBON TETRAFLUORIDE; KAPTON;

PLASMA JETS;

EID: 0032138693     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/3/005     Document Type: Article

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