Fabrication of vertical optical plane using DRIE and KOH crystalline etching of (1 1 0) silicon wafer

Sensors and Actuators, A: Physical

Volumn 128, Issue 2, 2006, Pages 387-394

  Yun, Sung Sik ^a   You, Sung Keun ^a   Lee, Jong Hyun ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

(1 1 0) Silicon; KOH etching; MEMS; Optical plane; Silicon DRIE; Vertical sidewall

Indexed keywords

CRYSTALLINE MATERIALS; ETCHING; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; OPTICAL RESONATORS; OPTIMIZATION; PLATES (STRUCTURAL COMPONENTS); SILICON WAFERS;

KOH ETCHING; OPTICAL PLANE; SILICON DRIE; VERTICAL SIDEWALL;

SILICON;

EID: 33646194224     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.02.015     Document Type: Article

References (12)

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