On the origin of the notching effect during etching in uniform high density plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 1, 1997, Pages 70-87

  Hwang, Gyeong S ^a   Giapis, Konstantinos P ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000830374     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589258     Document Type: Article

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