Etch rates for micromachining processing

Journal of Microelectromechanical Systems

Volumn 5, Issue 4, 1996, Pages 256-269

  Williams, Kirt R ^a,b,c   Muller, Richard S ^{a,b,d,e,f,g,h,i}  

^a IEEE

^b UNIVERSITY OF CALIFORNIA   (United States)

^c WESTERN DIGITAL CORPORATION   (United States)

^d STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^e CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^f UNIVERSITY OF CALIFORNIA   (United States)

^g Graduate School

^h University of California ^*

ⁱ HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; ETCHING; FABRICATION; PROCESSING; SINGLE CRYSTALS;

ETCH RATES; MICROMACHINING PROCESSING;

MICROMACHINING;

EID: 0030420887     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.546406     Document Type: Article

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