The MEMSNAS process: Microloading effect for micromachining 3-D structures of nearly all shapes

Journal of Microelectromechanical Systems

Volumn 13, Issue 2, 2004, Pages 190-199

  Bourouina, Tarik ^a   Masuzawa, Takahisa ^b   Fujita, Hiroyuki ^b  

^a ESIEE PARIS   (France)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Loading effect; Micromachining; Reactive ion etching (RIE); Three dimensional (3 D)

Indexed keywords

MASKS; MATHEMATICAL MODELS; MICROMACHINING; MICROSTRUCTURE; REACTIVE ION ETCHING; THREE DIMENSIONAL;

MICROFABRICATION; MICROHOLES; MICROLOADING EFFECT;

MICROELECTRONIC PROCESSING;

EID: 1942468589     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.823219     Document Type: Article

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