Mems for watches

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 1-4

  Noell, W ^a   Clerc, P A ^a   Jeanneret, S ^a   Hoogerwerf, A ^b   Niedermann, P ^b   Perret, A ^a,b   De Rooij, N F ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b CSEM   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; FRICTION; HALL EFFECT; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELD EFFECTS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OPTIMIZATION; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SENSORS;

DEEP REACTIVE ION ETCHING (DRIE); MAGNETIC SENSORS; MECHANICAL WATCHES; PRESSURE SENSORS;

WATCHES;

EID: 3042701556     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

1. B. Kloeck, S.D. Collins, N.F. de Rooij, R.L. Smith, "Study of electrochemical etch-stop for high-precision thickness control of silicon membranes", IEEE Transactions on Electron Devices, vol.36, no.4, pt.1, April 1989, pp.663-9. USA
2. www.intersema.com
3. F. Burger, P.A. Besse, R.S. Popovic, "New fully integrated 3-D silicon Hall sensor for precise angular-position measurement", Sensors and Actuators A, 67 (1998), pp. 72-76.
4. F. Gueissaz and D. Piguet, "The microreed, an ultra-small passive MEMS magnetic proximity sensor designed for portable applications", Proc. MEMS 2001, Interlaken, Switzerland, pp. 269-273.
5. M. Despont, H. Lorenz, N.Fahrni, J. Brugger. P. Renaud, and P. Vettiger, "High aspect ratio ultrathick, negative-tone near-UV photoresist for MEMS applications", Proc. IEEE MEMS (Nagoya, 1997) pp. 518-22.
6. L. Dellmann, S. Roth, C. Beuret, G.A. Racine, H. Lorenz, M. Despon, P. Renaud, P. Vettiger, N.F. de Rooij, "Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications", Sensors & Actuators A, 70, no.1-2 (1998), pp.42-7.
7. H. Lorenz, M. Despont, P. Vettiger, P. Renaud, "Fabrication of photoplastic high-aspect ration microparts and micromolds using SU-8 UV resist", Microsystem Technologies, 4 (1998) 143-146.
8. www.eta.ch and www.oscilloquartz.com.
9. F. Burger, P.A. Besse, R.S. Popovic, "Influence of silicon anisotropy on the sensitivity of Hall devices and on the accuracy of magnetic angular sensors", Sensors and Actuators A, 92 (2001), pp. 175-181.
10. C. Marxer, Ch. Thio, M.-A. Grétillat, N.F. de Rooij, O. Anthamatten, R. Bättig, B. Valk, and P. Vogel, "Vertical Mirrors Fabricated by Deep Re-active Ion Etching for Fiber-Optic Switching Applications", IEEE Journal of Micro Electro Mechanical Systems, Vol. 6, No 3, 1997, pp. 277-285.
11. Perret A., Hoogerwerf A., Niedermann P., Xiao-Ming Tang, Jeanneret S., Clerc P.-A., de Rooij N.F., Gygax P., "Silicon as material for mechani-cal wristwatches", SPIE-Int. Soc. Opt. Eng., Proceedings of Spie - the International Society for Optical Engineering, 4755 (2002), pp.645-7.
12. www.mimotec.ch.