Notching as an example of charging in uniform high density plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 560-565

  Kinoshita, Takashi ^a,b   Hane, Masami ^a,c   McVittie, James P ^a  

^a Stanford University   (United States)

^b KOBE STEEL LTD   (Japan)

^c NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000120994     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588431     Document Type: Article

References (9)

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9. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley Interscience, New York, 1994).