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Sensors and Materials

Volumn 14, Issue 5, 2002, Pages 231-237

Characteristics of plasmaless dry etching of silicon-related materials using chlorine trifluoride gas

(1) Saito, Yoji a

a SEIKEI UNIVERSITY (Japan)

Author keywords

Chlorine trifluoride; Isotropic etching; Plasmaless dry etching; Silicon; Silicon dioxide

Indexed keywords

EID: 0036353662 PISSN: 09144935 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (16)

References (12)

1
- 0030674571
- (1997) International Conf. on Solid-State Sensors and Actuators , pp. 671
- Toda, R.¹ Minami, K.² Esashi, M.³

2
- 0010082214
- in Japanese
- (1998) T. IEE Japan , vol.118 E , pp. 437
- Choi, J.-J.¹ Minami, K.² Esashi, M.³

3
- 0030675939
- Technical digest, 1997
- Chicago
- (1997) Int. Conf. on Solid-State Sensors and Actuators (Transducers '97) , vol.2 , pp. 1505
- Wang, X.Q.¹ Yang, X.² Walsh, K.³ Tai, Y.-C.⁴

4
- 0010193546
- in Japanese
- (2000) Seimitsu-Kogakkai-shi , vol.66 , pp. 871
- Ueda, T.¹ Kuribayashi, K.²

5
- 0021517388
- (1984) J. Appl. Phys. , vol.56 , pp. 2939
- Ibottoson, D.E.¹ Mucha, J.A.² Flamm, D.L.³ Cook, J.M.⁴

6
- 0009745638
- (1991) J. Vac. Sci. & Tech. , vol.B9 , pp. 2503
- Saito, Y.¹ Yamaoka, O.² Yoshida, A.³

7
- 0010179985
- ed. S. G. Pandalai (Transworld Research Network, Trivandrum)
- (1998) Recent Research Development in Electrochemistry , vol.1 , pp. 191
- Saito, Y.¹

8
- 0010193547
- (1990) Applied Physics Letters , vol.56 , pp. 1119
- Saito, Y.¹ Yamaoka, O.² Yoshida, A.³

9
- 0010122522
- (1992) IEICE of Japan Trans. on Electron. , vol.E75 , pp. 834
- Saito, Y.¹ Hirabaru, M.² Yoshida, A.³

10
- 0001681751
- (1987) Phys. Rev. , vol.B36 , pp. 6613
- Winters, H.F.¹ Haarer, D.²

11
- 0010083736
- In print
- (2002) Jpn. J. Appl. Phys. , vol.41
- Saito, Y.¹ Tokuda, K.²

12
- 0039272959
- (1985) Appl. Phys. Lett. , vol.46 , pp. 794
- Ibottoson, D.E.¹ Mucha, J.A.² Flamm, D.L.³ Cook, J.M.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.