Mechanisms of surface reactions in thin solid film chemical deposition processes

Coordination Chemistry Reviews

Volumn 257, Issue 23-24, 2013, Pages 3177-3191

  Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Atomic layer deposition; Infrared absorption spectroscopy; Metalorganic compounds; Reaction mechanism; Surface chemistry; Surface sensitive techniques; X ray photoelectron spectroscopy

Indexed keywords

EID: 84885471002     PISSN: 00108545     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ccr.2013.04.006     Document Type: Review

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