Why is coordination chemistry stretching the limits of micro-electronics technology?

Coordination Chemistry Reviews

Volumn 178-180, Issue PART 2, 1998, Pages 1785-1809

  Doppelt, Pascal ^a  

^a CNRS   (France)

Author keywords

Copper CVD; Copper films; Metallization; SAMs; Selective copper deposition; Surface derivatization; Volatile copper complexes

Indexed keywords

EID: 0000721084     PISSN: 00108545     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0010-8545(98)00087-3     Document Type: Article

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