Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth

Journal of Applied Physics

Volumn 104, Issue 8, 2008, Pages

  Rodríguez Reyes, Juan Carlos F ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC LAYER DEPOSITION; DEPOSITION; DIFFUSION BARRIERS; FORMING; HAFNIUM; LIGANDS; MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; SILICON; SURFACE REACTIONS; TANTALUM; TERNARY SYSTEMS; TITANIUM; TRANSITION METALS; TUNGSTEN; ULTRATHIN FILMS; VAPOR DEPOSITION; ZIRCONIUM;

ATOMIC LAYERS; DIMETHYLAMIDO; FUNCTIONAL METHODS; H BONDS; LOW TEMPERATURES; SILICON SUBSTRATES; STABLE STRUCTURES; TETRAKIS; TETRAKIS(DIMETHYLAMIDO)TITANIUM;

FILM GROWTH;

EID: 55249106908     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3000654     Document Type: Article

References (27)

1. R. L. Puurunen, J. Appl. Phys. 0021-8979 10.1063/1.1940727 97, 121301 (2005).
2. M. Putkonen and L. Niinisto, Top. Organomet. Chem. 9, 125 (2005).
3. H. Kim, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1622676 21, 2231 (2003).
4. J. C. F. Rodríguez-Reyes and A. V. Teplyakov, Chem.-Eur. J. 0947-6539 10.1002/chem.200700856 13, 9164 (2007).
5. D. M. Hausmann, E. Kim, J. Becker, and M. S. Gordon, Chem. Mater. 0897-4756 10.1021/cm020357x 14, 4350 (2002).
6. K. Kukli, T. Pilvi, M. Ritala, T. Sajavaara, J. Lu, and M. Leskela, Thin Solid Films 0040-6090 10.1016/j.tsf.2005.05.050 491, 328 (2005).
7. A. E. Kaloyeros and E. Eisenbraun, Annu. Rev. Mater. Sci. 0084-6600 10.1146/annurev.matsci.30.1.363 30, 363 (2000).
8. J. S. Becker, S. Suh, S. Wang, and M. S. Gordon, Chem. Mater. 0897-4756 10.1021/cm021772s 15, 2969 (2003).
9. J. Kim, S. Lee, and K. Yong, Jpn. J. Appl. Phys., Part 1 45, 7080 (2006). 0021-4922
10. S. Consiglio, F. Papadatos, S. Naczas, S. Skordas, E. Eisenbraun, and A. E. Kaloyeros, J. Electrochem. Soc. 0013-4651 10.1149/1.2338634 153, F249 (2006).
11. A. Martin Hoyas, Y. Travaly, J. Schuhmacher, T. Sajavaara, C. M. Whelan, B. Eyckens, O. Richard, S. Giangrandi, B. Brijs, W. Vandervorst, and K. Maex, J. Appl. Phys. 0021-8979 10.1063/1.2182074 99, 063515 (2006).
12. K. -S. Kim, M. -S. Lee, S. -S. Yim, H. -M. Kim, K. -B. Kim, H. -S. Park, W. Koh, W. -M. Li, M. Stokhof, and H. Sprey, Appl. Phys. Lett. 0003-6951 10.1063/1.2338768 89, 081913 (2006).
13. M. B. Takeyama, T. Itoi, E. Aoyagi, and A. Noya, Appl. Surf. Sci. 0169-4332 10.1016/S0169-4332(03)00447-1 216, 181 (2003).
14. J. E. Crowell, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1600451 21, S88 (2003).
15. J. -W. Lim, H. -S. Park, and S. -W. Kang, J. Electrochem. Soc. 0013-4651 10.1149/1.1368102 148, C403 (2001).
16. J. -H. Kim, J. -Y. Kim, and S. -W. Kang, J. Appl. Phys. 0021-8979 10.1063/1.1883728 97, 093505 (2005).
17. S. F. Bent, J. Phys. Chem. B 1089-5647 10.1021/jp012995t 106, 2830 (2002).
18. T. Leftwich and A. V. Teplyakov, Surf. Sci. Rep. 63, 1 (2008). 0167-5729
19. J. C. F. Rodríguez-Reyes and A. V. Teplyakov, J. Phys. Chem. C 1932-7447 10.1021/jp067929b 111, 4800 (2007).
20. J. C. F. Rodríguez-Reyes and A. V. Teplyakov, J. Phys. Chem. C 112, 9695 (2008). 1932-7447
21. J. M. Frisch, GAUSSIAN 03, Revision C. 02, Gaussian, Inc., Wallingford, CT, 2004.
22. A. B. Mukhopadhyay and C. B. Musgrave, Appl. Phys. Lett. 0003-6951 10.1063/1.2721118 90, 173120 (2007).
23. J. C. F. Rodríguez-Reyes and A. V. Teplyakov, J. Phys. Chem. C 1932-7447 10.1021/jp074656r 111, 16498 (2007).
24. M. E. Davie, T. Foerster, S. Parsons, C. Pulham, D. W. H. Rankin, and B. A. Smart, Polyhedron 0277-5387 10.1016/j.poly.2005.10.019 25, 923 (2006).
25. D. C. Bradley and M. H. Chisholm, Acc. Chem. Res. 0001-4842 10.1021/ar50103a005 9, 273 (1976).
26. R. A. Andersen, D. B. Beach, and W. L. Jolly, Inorg. Chem. 0020-1669 10.1021/ic00220a062 24, 4741 (1985).
27. Although it is possible to obtain stable structures for the reaction of Ta [N (CH3) 2] 5, successive structures along a pathway are very different due to the several rotations of ligands within this sterically crowded compound. The search for transition states for Ta using SQTN is not feasible in these conditions; other methods may be used, but these are beyond the aim of this investigation. The similarity of the barriers for the reactions under investigation for the other alkylamido precursors indicate that Ta [N (CH3) 2] 5 may follow a similar energy landscape.