Use of 1,1-dimethylhydrazine in the atomic layer deposition of transition metal nitride thin films

Journal of the Electrochemical Society

Volumn 147, Issue 9, 2000, Pages 3377-3381

  Juppo, Marika ^a   Ritala, Mikko ^a,b   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

HYDRAZINE; NITRIDES; THIN FILMS; TRANSITION METAL COMPOUNDS;

ATOMIC LAYER DEPOSITIONS; DIMETHYLHYDRAZINES; TRANSITION METAL NITRIDES;

ELECTRODEPOSITION;

EID: 0034275371     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393909     Document Type: Article

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