Atomic layer deposition of copper oxide using copper(II) acetylacetonate and ozone

Chemical Vapor Deposition

Volumn 18, Issue 4-6, 2012, Pages 173-178

  Alnes, Mari Endresen ^a   Monakhov, Edouard ^a   Fjellvåg, Helmer ^a   Nilsen, Ola ^a  

^a UNIVERSITY OF OSLO   (Norway)

Author keywords

ALD; Copper acetylacetonate; Copper oxide; p Type oxide; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; OXIDE FILMS; OZONE; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ACETYLACETONATES; COMPLEX COMPOUNDS; DEPOSITED FILMS; DEPOSITION PROCESS; DEPOSITION TEMPERATURES; P-TYPE OXIDES; TEMPERATURE WINDOW; X RAY REFLECTIVITY;

COPPER OXIDES;

EID: 84862155249     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201106959     Document Type: Article

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