Activation of metal-organic precursors by electron bombardment in the gas phase for enhanced deposition of solid films

Journal of Physical Chemistry Letters

Volumn 3, Issue 17, 2012, Pages 2523-2527

  Sun, Huaxing ^a   Qin, Xiangdong ^a   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRACKING PATTERNS; DISSOCIATIVE ADSORPTION; ELECTRON BOMBARDMENTS; ELECTRON-IMPACT; ELECTRON-IMPACT IONIZATION; GASPHASE; ION GAUGES; METAL ORGANIC COMPOUND; METAL ORGANIC PRECURSORS; NATIVE OXIDE LAYER; SI(1 0 0); SILICON DIOXIDE FILM; SILICON SURFACES; SOLID FILMS; STABLE PRECURSORS;

ADSORPTION; FILM GROWTH; IMPACT IONIZATION; MANGANESE; MASS SPECTROMETRY; OXIDE FILMS; PHOTODISSOCIATION; PHOTOELECTRONS; SILICA; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84865959750     PISSN: None     EISSN: 19487185     Source Type: Journal    
DOI: 10.1021/jz3011332     Document Type: Article

References (36)

1. Kapteijn, F.; Vanlangeveld, A. D.; Moulijn, J. A.; Andreini, A.; Vuurman, M. A.; Turek, A. M.; Jehng, J. M.; Wachs, I. E. Alumina-Supported Manganese Oxide Catalysts. I. Characterization: Effect of Precursor and Loading J. Catal. 1994, 150, 94-104
2. Thackeray, M. M. Manganese Oxides for Lithium Batteries Prog. Solid State Chem. 1997, 25, 1-71
3. Winter, M.; Besenhard, J. O.; Spahr, M. E.; Novák, P. Insertion Electrode Materials for Rechargeable Lithium Batteries Adv. Mater. 1998, 10, 725-763
4. Shukla, A. K.; Prem Kumar, T. Materials for Next-Generation Lithium Batteries Curr. Sci. 2008, 94, 314-331
5. Bélanger, D.; Brousse, T.; Long, J. W. Manganese Oxides: Battery Materials Make the Leap to Electrochemical Capacitors Electrochem. Soc. Interface 2008, 17, 49-52
6. Xu, C.; Kang, F.; Li, B.; Du, H. Recent Progress on Manganese Dioxide Based Supercapacitors J. Mater. Res. 2010, 25, 1421-1432
7. Wen-bin, S.; Durose, K.; Brinkman, A. W.; Tanner, B. K. Growth and Characterization of Magnetic Metal Mn Film by MOCVD Mater. Chem. Phys. 1997, 47, 75-77
8. Nakamura, T.; Tai, R.; Nishimura, T.; Tachibana, K. Spectroscopic Study on Metallorganic Chemical Vapor Deposition of Manganese Oxide Films J. Electrochem. Soc. 2005, 152, C584-C587
9. Topol, A. W.; Dunn, K. A.; Barth, K. W.; Nuesca, G. M.; Taylor, B. K.; Dovidenko, K.; Kaloyeros, A. E.; Tuenge, R. T.; King, C. N. Chemical Vapor Deposition of ZnS:Mn for Thin-Film Electroluminescent Display Applications J. Mater. Res. 2004, 19, 697-706
10. Koike, J.; Wada, M. Self-Forming Diffusion Barrier Layer in Cu-Mn Alloy Metallization Appl. Phys. Lett. 2005, 87, 041911
11. y Barrier Layer IEEE Trans. Electron Devices 2006, 53, 2492-2499
12. 2 Interface J. Appl. Phys. 2007, 102, 043527
13. 2 Interface at 250 °C Appl. Phys. Lett. 2007, 90, 252107
14. Iijima, J.; Fujii, Y.; Neishi, K.; Koike, J. Resistivity Reduction by External Oxidation of Cu-Mn Alloy Films for Semiconductor Interconnect Application J. Vac. Sci. Technol., B 2009, 27, 1963-1968
15. Leskelä, M.; Ritala, M. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges Angew. Chem., Int. Ed. 2003, 42, 5548-5554
16. Zaera, F. The Surface Chemistry of Thin Film Atomic Layer Deposition (ALD) Processes for Electronic Device Manufacturing J. Mater. Chem. 2008, 18, 3521-3526
17. George, S. M. Atomic Layer Deposition: An Overview Chem. Rev. 2010, 110, 111-131
18. Zaera, F. The Surface Chemistry of Atomic Layer Depositions of Solid Thin Films J. Phys. Chem. Lett. 2012, 3, 1301-1309
19. 2/Si(100) Surfaces upon Manganese Deposition J. Phys. Chem. Lett. 2011, 2, 2525-2530
20. 4 on Silica J. Phys. Chem. 1993, 97, 5085-5094
21. Kelly, M. J.; Han, J. H.; Musgrave, C. B.; Parsons, G. N. In-Situ Infrared Spectroscopy and Density Functional Theory Modeling of Hafnium Alkylamine Adsorption on Si-OH and Si-H Surfaces Chem. Mater. 2005, 17, 5305-5314
22. Dai, M.; Kwon, J.; Halls, M. D.; Gordon, R. G.; Chabal, Y. J. Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide Langmuir 2010, 26, 3911-3917
23. Ohtsu, N.; Oku, M.; Nomura, A.; Sugawara, T.; Shishido, T.; Wagatsuma, K. X-ray Photoelectron Spectroscopic Studies on Initial Oxidation of Iron and Manganese Mono-Silicides Appl. Surf. Sci. 2008, 254, 3288-3294
24. 3, n = 1 J. Organomet. Chem. 1987, 326, 89-92
25. Wen-bin, S.; Durose, K.; Brinkman, A. W.; Woods, J. In-Situ Mass Spectrometric Investigation of Tricarbonyl (Methylcyclopentadienyl) Manganese (TCMn) Pyrolysis Mechanism During MOVPE J. Cryst. Growth 1991, 113, 1-8
26. 10 during Deposition of Thin Manganese Films on Silicon Oxide and on Copper Surfaces J. Vac. Sci. Technol., A 2012, 30, 01A112
27. Profijt, H. B.; Potts, S. E.; van de Sanden, M. C. M.; Kessels, W. M. M. Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges J. Vac. Sci. Technol., A 2011, 29, 050801
28. Blum, S. E.; Brown, K. H.; Srinivasan, R. Photo Deposition of Metals with Far UV Radiation. Patent US 4451503, 1984.
29. George, P. M.; Beauchamp, J. L. Deposition of Metal Films by the Controlled Decomposition of Organometallic Compounds on Surfaces Thin Solid Films 1980, 67, L25-L28
30. Brocherieux, A.; Dessaux, O.; Goudmand, P.; Gengembre, L.; Grimblot, J.; Brunel, M.; Lazzaroni, R. Characterization of Nickel Films Deposited by Cold Remote Nitrogen Plasma on Acrylonitrile-Butadiene-Styrene Copolymer Appl. Surf. Sci. 1995, 90, 47-58
31. van Dorp, W. F.; Hagen, C. W. A Critical Literature Review of Focused Electron Beam Induced Deposition J. Appl. Phys. 2008, 104, 081301-081342
32. Wnuk, J. D.; Rosenberg, S. G.; Gorham, J. M.; van Dorp, W. F.; Hagen, C. W.; Fairbrother, D. H. Electron Beam Deposition for Nanofabrication: Insights from Surface Science Surf. Sci. 2011, 605, 257-266
33. 4 and Ammonia J. Phys. Chem. B 2006, 110, 13491-13498
34. Handbook of X-Ray Photoelectron Spectroscopy; Wagner, C. D.; Riggs, W. M.; Davis, L. E.; Moulder, J. F.; Muilenberg, G. E., Eds.; Perkin-Elmer Corporation: Eden Prairie, MN, 1978.
35. Bouman, M.; Zaera, F. The Surface Chemistry of Atomic Layer Deposition (ALD) Processes for Metal Nitride and Metal Oxide Film Growth ECS Trans. 2010, 33, 291-305
36. Bouman, M.; Zaera, F. Reductive Eliminations from Amido Metal Complexes: Implications for Metal Film Deposition J. Electrochem. Soc. 2011, 158, D524-D526