Reductive eliminations from amido metal complexes: Implications for metal film deposition

Journal of the Electrochemical Society

Volumn 158, Issue 8, 2011, Pages

  Bouman, Menno ^a   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETHYLAMIDO; DIMETHYLAMINES; HYDRIDE ELIMINATION; METAL FILM DEPOSITION; METAL NITRIDES; REDUCTIVE ELIMINATION; TETRAKIS; TETRAKIS(DIMETHYLAMIDO)TITANIUM;

ATOMIC LAYER DEPOSITION; METAL COMPLEXES; NITRIDES; PYROLYSIS; TANTALUM; TERNARY SYSTEMS; TITANIUM; TITANIUM COMPOUNDS;

METALS;

EID: 80051744284     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3599068     Document Type: Article

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