X-ray-initiated metal-promoted thin film growth

Journal of Physical Chemistry C

Volumn 116, Issue 15, 2012, Pages 8594-8600

  Kim, Taeseung ^a   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMALITY; DIMETHYLAMIDO; EARLY TRANSITION METALS; EXCITATION SOURCES; FILM DEPOSITION; INITIAL EXCITATION; LOW TEMPERATURES; MECHANISTIC STUDIES; METAL ORGANIC PRECURSORS; PHOTORESIST MASK; POLYMERIZATION PROCESS; SECONDARY ELECTRONS; SOFT X-RAY; SOLID FILMS; SPATIAL RESOLUTION; TANTALUM FOILS; UNDERLYING SURFACE; X-RAY EXCITATION;

FILM GROWTH; PHOTORESISTS; POLYMERIC FILMS; POLYMERIZATION; TANTALUM; TRANSITION METALS;

X RAYS;

EID: 84860197692     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp2123339     Document Type: Article

References (26)

1. Sugiyama, K.; Pac, S.; Takahashi, Y.; Motojima, S. J. Electrochem. Soc. 1975, 122, 1545-1549
2. Maeng, W. J.; Park, S.-J.; Kim, H. J. Vac. Sci. Technol., B 2006, 24, 2276-2281
3. Xie, Q.; Deduytsche, D.; Musschoot, J.; Meirhaeghe, R. L. V.; Detavernier, C.; Ding, S. F.; Qu, X. P. Microelectron. Eng. 2011, 88, 646-650
4. Kim, T.; Zaera, F. J. Phys. Chem. C 2011, 115, 8240-8247
5. Randolphab, S. J.; Fowlkesab, J. D.; Rackab, P. D. Crit. Rev. Solid State Mater. Sci. 2006, 31, 55-89
6. Utke, I.; Gölzhäuser, A. Angew. Chem., Int. Ed. 2010, 49, 9328-9330
7. Wnuk, J. D.; Rosenberg, S. G.; Gorham, J. M.; van Dorp, W. F.; Hagen, C. W.; Fairbrother, D. H. Surf. Sci. 2011, 605, 257-266
8. Zaera, F. J. Vac. Sci. Technol., A 1989, 7, 640-645
9. Handbook of X-Ray Photoelectron Spectroscopy; Wagner, C. D.; Riggs, W. M.; Davis, L. E.; Moulder, J. F.; Muilenberg, G. E., Eds.; Perkin-Elmer Corporation: Eden Prairie, MN, 1978.
10. Wilson, J.; Guo, H.; Morales, R.; Podgornov, E.; Lee, I.; Zaera, F. Phys. Chem. Chem. Phys. 2007, 9, 3830-3852
11. Seah, M. P.; Dench, W. A. Surf. Interface Anal. 1979, 1, 2-11
12. Laibinis, P. E.; Graham, R. L.; Biebuyck, H. A.; Whitesides, G. M. Science 1991, 254, 981-983
13. Zharnikov, M.; Grunze, M. J. Vac. Sci. Technol., B 2002, 20, 1793-1807
14. Michael, Z. J. Electron Spectrosc. Relat. Phenom. 2010, 178-179, 380-393
15. Arumainayagam, C. R.; Lee, H.-L.; Nelson, R. B.; Haines, D. R.; Gunawardane, R. P. Surf. Sci. Rep. 2010, 65, 1-44
16. Olsen, C. J. Chem. Phys. 1998, 108, 3750-3764
17. Chen, S.-J.; Zhang, X.-H.; Yu, X.; Qiu, H.; Yap, G. P. A; Guzei, I. A.; Lin, Z.; Wu, Y.-D.; Xue, Z.-L. J. Am. Chem. Soc. 2007, 129, 14408-14421
18. Zhang, X.-H.; Chen, S.-J.; Cai, H.; Im, H.-J.; Chen, T.; Yu, X.; Chen, X.; Lin, Z.; Wu, Y.-D.; Xue, Z.-L. Organometallics 2008, 27, 1338-1341
19. Bouman, M.; Zaera, F. J. Electrochem. Soc. 2011, 158, D524-D526
20. Misra, D.; Iwai, H.; Wong, H. Electrochem. Soc. Interface 2005, 14, 30-34
21. Robertson, J. Rep. Prog. Phys. 2006, 69, 327-396
22. Shen, H.; Ramanathan, R. Microelectron. Eng. 2006, 83, 206-212
23. Möhring, P. C.; Coville, N. J. J. Organomet. Chem. 1994, 479, 1-29
24. Pan, J.; Woo, C.; Ngo, M. V.; Besser, P.; Pellerin, J.; Qi, X.; Ming-Ren, L. IEEE Electron Device Lett. 2003, 24, 547-549
25. Park, T. J.; Kim, J. H.; Jang, J. H.; Na, K. D.; Hwang, C. S.; Kim, G.; Choi, J. H.; Choi, K. J.; Jeong, J. H. Appl. Phys. Lett. 2007, 91, 252106/252101-252106/252103
26. Song, M. K.; Rhee, S. W. J. Electrochem. Soc. 2008, 155, H823-H828