Chemical nature of the thin films that form on SiO2/Si(100) surfaces upon manganese deposition

Journal of Physical Chemistry Letters

Volumn 2, Issue 20, 2011, Pages 2525-2530

  Sun, Huaxing ^a   Qin, Xiangdong ^a   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL NATURE; COPPER INTERCONNECTS; MANGANESE SILICIDE FILMS; MANGANESE-SILICATE; MICROELECTRONIC APPLICATIONS; MICROELECTRONIC FABRICATION; SELF FORMATION; SILICON DIOXIDE LAYERS; SILICON SUBSTRATES; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

MANGANESE; MANGANESE COMPOUNDS; MICROELECTRONIC PROCESSING; MICROELECTRONICS; PHOTOELECTRON SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICATES; SILICIDES; SILICON OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON WAFERS;

EID: 80054955531     PISSN: None     EISSN: 19487185     Source Type: Journal    
DOI: 10.1021/jz201177w     Document Type: Article

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