Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

Applied Physics Letters

Volumn 92, Issue 20, 2008, Pages

  Kim, Jiyoung ^a   Lee, Bongki ^a   Park, Seong Yong ^a   Kim, Hyun Chul ^a   Cho, Kyeongjae ^a   Vogel, Eric M ^a   Kim, Moon J ^a   Wallace, Robert M ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC LAYER DEPOSITION; GRAPHITE; HYDROPHILICITY; NUCLEATION; PYROLYSIS;

NUCLEATION SITES; PREFERENTIAL DEPOSITION; PYROLYTIC GRAPHITE SURFACE; TRIMETHYLALUMINUM (TMA);

NANOELECTRONICS;

EID: 44349165054     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2928228     Document Type: Article

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