Plasma-enhanced atomic layer deposition of Ta-N thin films

Journal of the Electrochemical Society

Volumn 149, Issue 1, 2002, Pages

  Park, Jin Seong ^a   Park, Hyung Sang ^b   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Genitech Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DEPOSITION; ELECTRIC CONDUCTIVITY; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; TANTALUM COMPOUNDS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD);

ELECTROCHEMISTRY;

EID: 0036222640     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1423642     Document Type: Article

References (12)