SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1943-1954

Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

(3) Kajikawa, Yuya a Noda, Suguru a Komiyama, Hiroshi a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANISOTROPY; COMPUTER SIMULATION; DIFFUSION; ETCHING; GRAIN GROWTH; INTERFACES (MATERIALS); INTERFACIAL ENERGY; MORPHOLOGY; NUCLEATION; SPUTTER DEPOSITION;

FILM FORMATION PROCESS; PREFERRED ORIENTATION; RESPUTTERING; SOLID-SOLID INTERFACE; STICKING PROCESS; SURFACE DIFFUSION; TANTALUM NITRIDE; VAPOR SOLID INTERFACE;

NITRIDES;

EID: 0842333276 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1619414 Document Type: Article

Times cited : (111)

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