Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

Journal of Applied Physics

Volumn 92, Issue 9, 2002, Pages 5084-5093

  Shin, C S ^a   Gall, D ^a   Kim, Y W ^a   Hellgren, N ^a   Petrov, I ^a   Greene, J E ^a  

^a United States of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATIVE CHEMISORPTION; FLUX RATIO; ION ENERGIES; ION SURFACE INTERACTIONS; LOW ENERGIES; LOW-ENERGY ION IRRADIATION; MAGNETRON SPUTTER DEPOSITION; OVER-STOICHIOMETRIC; PARALLEL SETS; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; TEXTURE EVOLUTIONS;

CHEMISORPTION; IONS; SODIUM CHLORIDE; TANTALUM; TEXTURES;

TANTALUM COMPOUNDS;

EID: 18744364749     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1510558     Document Type: Article

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