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Applied Physics A: Materials Science and Processing

Volumn 72, Issue 5, 2001, Pages 541-550

Texturing effects in molybdenum and aluminum nitride films correlated to energetic bombardment during sputter deposition

(4) Drusedau T P a Koppenhagen, K a Blasing J a John, T M b

a OTTO VON GUERICKE UNIVERSITY (Germany)

b PT and B Plasma Technologie und Beschichtungen GmbH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ATOMS; CALORIMETRY; COMPUTER SIMULATION; IRRADIATION; KINETIC ENERGY; MATHEMATICAL MODELS; MOLYBDENUM; MONTE CARLO METHODS; PRESSURE EFFECTS; SPUTTER DEPOSITION; SURFACE PROPERTIES;

ENERGETIC BOMBARDMENT; HEAT OF CONDENSATION; NEUTRALS; PLASMA IRRADIATION; TEXTURING EFFECTS;

THIN FILMS;

EID: 0034975727 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100812 Document Type: Article

Times cited : (19)

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