Mechanisms Controlling Preferred Orientation of Chemical Vapour Deposited Polycrystalline Films

Solid State Phenomena

Volumn 93, Issue , 2003, Pages 411-416

  Kajikawa, Yuya ^a   Noda, Suguru ^a   Komiyama, Hiroshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Chemical Vapor Deposition; Preferred Orientation; Silicon; Silicon Carbide; Texture

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; SUBSTRATES; TEXTURES;

POLYCRYSTALLINE FILMS;

THIN FILMS;

EID: 0242413986     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.93.411     Document Type: Conference Paper

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