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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages 1717-1723

Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation

(5) Li, T Q a Noda, S a Komiyama, H a Yamamoto, T a Ikuhara, Y a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL GROWTH; CRYSTALS; MAGNETRON SPUTTERING; PARTIAL PRESSURE; SILICON;

CRYSTAL GRAINS;

TITANIUM NITRIDE;

EID: 0142027007 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1598975 Document Type: Conference Paper

Times cited : (36)

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