SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 66, Issue 1, 2002, Pages 59-64

Structure and properties of copper nitride films formed by reactive magnetron sputtering

(1) Pierson, J F a

a FEMTO ST INSTITUTE (France)

Author keywords

Cu3N; Electrical resistivity; Hardness; Reactive sputtering; Structure

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC CONDUCTIVITY; GLASS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MICROHARDNESS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; STEEL; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION;

REACTIVE SPUTTERING; ULTRAVIOLET-VISIBLE SPECTROMETRY;

COPPER COMPOUNDS;

EID: 0036607059 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(01)00425-0 Document Type: Article

Times cited : (123)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.