Development of texture in TiN films by use of in situ synchrotron x-ray scattering

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 2037-2044

  Schell, N ^a   Matz, W ^a   Bottiger J ^b   Chevallier, J ^b   Kringhoj P ^b  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b AARHUS UNIVERSITY   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PARAMETERS; DRIVING FORCES; FILM SURFACES; IN-SITU; IN-SITU SYNCHROTRONS; MAGNETRON SOURCES; MICROSTRUCTURAL DEVELOPMENT; MINIMALIZATION; SYNCHROTRON-RADIATION BEAM LINE; TEXTURE DEVELOPMENT; TIN FILMS; VACUUM CHAMBERS; X-RAY DIFFRACTION AND REFLECTIVITY;

METALLIC FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION;

TEXTURES;

EID: 0037083827     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1436558     Document Type: Article

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