SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 141, Issue 2-3, 2001, Pages 156-163

Role of process parameters in the texture evolution of TiN films deposited by hollow cathode discharge ion plating

(3) Chen, Y M a,b Yu, G P a Huang, J H a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

Hollow cathode discharge; Preferred orientation; Titanium nitride

Indexed keywords

TITANIUM NITRIDE FILMS;

CRYSTAL ORIENTATION; DISLOCATIONS (CRYSTALS); GAS DISCHARGE TUBES; ION BOMBARDMENT; PHYSICAL VAPOR DEPOSITION; STRAIN; THERMODYNAMIC STABILITY; TITANIUM NITRIDE;

THIN FILMS;

COATING; TITANIUM NITRIDE; VAPOR DEPOSITION; WEAR RESISTANCE;

EID: 0035907497 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01201-4 Document Type: Article

Times cited : (31)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.