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Materials Science and Engineering: A

Volumn 325, Issue 1-2, 2002, Pages 380-388

Growth mechanism of reactively sputtered aluminum nitride thin films

(4) Hwang, Bing Hwai a Chen, Chi Shan a Lu, Hong Yang a Hsu, Tzu Chien a

a NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

Author keywords

Aluminum nitride; Growth mechanism; Microstructure; Reactive sputtering; Thin film

Indexed keywords

ALUMINUM NITRIDE; CRYSTALLOGRAPHY; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GROWTH MECHANISM;

THIN FILMS;

FILM; SOLID LUBRICANT; SPUTTERING;

EID: 0037186787 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5093(01)01477-0 Document Type: Article

Times cited : (80)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.