The effects of deposition parameters on the crystallographic orientation of AIN films prepared by RF reactive sputtering

Vacuum

Volumn 48, Issue 5, 1997, Pages 427-429

  Wang, B ^a   Zhao, Y N ^a   He, Z ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; DEPOSITION; MAGNETRON SPUTTERING; MIXTURES; SILICON WAFERS; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY;

ALUMINUM NITRIDE; RADIOFREQUENCY MAGNETRON REACTIVE SPUTTERING;

DIELECTRIC FILMS;

EID: 0031145770     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00001-8     Document Type: Article

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