Low energy ion assist during deposition - An effective tool for controlling thin film microstructure

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 127-128, Issue , 1997, Pages 796-808

  Ensinger, W ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM; SILVER; SPUTTER DEPOSITION; TITANIUM NITRIDE;

LOW ENERGY ION ASSISTED DEPOSITION;

THIN FILMS;

EID: 0031547708     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00010-4     Document Type: Article

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