Roles of ion irradiation for crystalline growth and internal stresses in nickel films onto silicon substrates prepared by the ion beam and vapor deposition method

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 6, 1997, Pages 3086-3092

  Kuratani, Naoto ^a   Murakami, Yasuo ^a   Imai, Osamu ^a   Ebe, Akinori ^a   Nishiyama, Satoshi ^a   Ogata, Kiyoshi ^a  

^a NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031480446     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580851     Document Type: Article

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