Control of the preferred orientation of AlN thin films by collimated sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1244-1246

  Rodriguez Navarro A ^a   Otano Rivera W ^b   Pilione, L J ^b   Messier, R ^b   Garcia Ruiz J M ^a  

^a Instituto Andaluz Ciencias T   (Spain)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0345434457     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581267     Document Type: Article

References (20)

1. J. D. MacKenzie, C. R. Abernathy, S. J. Pearton, V. Krishnamoorthy, S. Bharatan, K. S. Jones, and R. G. Wilson, Appl. Phys. Lett. 67, 253 (1995).
2. P. K. Kuo, G. W. Auner, and Z. L. Wu, Thin Solid Films 253, 223 (1994).
3. H. Okano, Y. Takahashi, T. Tanaka, K. Shibata, and S. Nakano, Jpn. J. Appl. Phys., Part 1 31, 3446 (1992).
4. F. Yang, E. Namuri, S. Patel, and D. T. Shaw, Physica C 244, 304 (1995).
5. R. Rodríguez-Clemente, B. Aspar, N. Azema, B. Armas, C. Combescure, J. Durand, and A. Figueras, J. Cryst. Growth 133, 59 (1993).
6. S. L. Duan, J. O. Artman, J. W. Lee, B. Wong, and D. E. Laughlin, IEEE Trans. Magn. 25, 3884 (1989).
7. T. Hara, T. Nomura, and S. C. Chen, Jpn. J. Appl. Phys., Part 2 31, L1746 (1992).
8. R. V. Joshi, H. M. Dalal, and R. Filippi, Appl. Phys. Lett. 96, 2484 (1995).
9. A. Rodríguez-Navarro, W. Otaño-Rivera, J. M. García-Ruiz, R. Messier, and L. J. Pilione, J. Mater. Res. 12, 1689 (1997).
10. L. G. Schulz, J. Appl. Phys. 20, 1030 (1949).
11. G. L. Huffman, D. E. Fahnline, R. Messier, and L. J. Pilione, J. Vac. Sci. Technol. A 7, 2252 (1989).
12. E. J. Bienk, H. Jensen, G. N. Pedersen, and G. Sorensen, Thin Solid Films 230, 121 (1993).
13. H. Okano, Y. Takahashi, T. Tanaka, K. Shibata, and S. Nakano, Jpn. J. Appl. Phys., Part 1 31, 3446 (1992).
14. A. Rodríguez-Navarro, W. Otaño-Rivera, J. M. García-Ruiz, R. Messier, and L. J. Pilione, J. Mater. Res. 12, 1850 (1997).
15. J. M. E. Harper, J. J. Cuomo, and H. T. G. Hentzell, Appl. Phys. Lett. 43, 547 (1983).
16. H. Windischmann, Thin Solid Films 154, 159 (1987).
17. D. Liu, S. K. Dew, and M. J. Brett, J. Appl. Phys. 74, 1339 (1993).
18. R. Hergt and H. Pfeiffer, Phys. Status Solidi A 92, K89 (1985).
19. F. Ying, R. W. Smith, and D. J. Srolovitz, Appl. Phys. Lett. 69, 3007 (1996).
20. K. Wasa and S. Hayakawa, Handbook of Sputter Deposition Technology (Noyes, Park Ridge, NJ, 1992), pp. 57-61.