Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 583-588

  Li, T Q ^a   Noda, S ^a   Tsuji, Y ^a   Ohsawa, T ^a   Komiyama, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; FILM GROWTH; MAGNETRON SPUTTERING; NITROGEN; PARTIAL PRESSURE; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; TEXTURES; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

INITIAL GROWTH; NUCLEI; POLYCRYSTALLINE LAYER; REACTIVE MAGNETRON SPUTTERING; TEXTURE FORMATION;

TITANIUM NITRIDE;

EID: 0036564749     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1458944     Document Type: Article

References (19)