Preferred orientation of TiN films studied by a real time synchrotron x-ray scattering

Journal of Applied Physics

Volumn 81, Issue 9, 1997, Pages 6126-6133

  Je, J H ^a,b   Noh, D Y ^a,c   Kim, H K ^d   Liang, K S ^a  

^a EXXONMOBIL UPSTREAM RESEARCH COMPANY   (United States)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Gwangju Institute of Science and Technology (GIST)   (South Korea)

^d Pusan Chatolic University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTROMAGNETIC WAVE SCATTERING; LATTICE CONSTANTS; MORPHOLOGY; SPUTTER DEPOSITION; SURFACES; SYNCHROTRON RADIATION; TITANIUM NITRIDE; X RAY POWDER DIFFRACTION; X RAYS;

DIFFRACTION PATTERNS; FILM THICKNESS; RADIO FREQUENCY SPUTTERING GROWTH; REAL TIME SYNCHROTRON X RAY SCATTERING; X RAY REFLECTIVITY;

FILM GROWTH;

EID: 0031147325     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364394     Document Type: Article

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