Texture formation in sputter-deposited (Nb 0.7,Ti 0.3)N thin films

Journal of Applied Physics

Volumn 92, Issue 9, 2002, Pages 4999-5005

  Iosad, N N ^a   Van Der Pers, N M ^b   Grachev, S ^c   Roddatis, V V ^d   Jackson, B D ^e   Polyakov, S N ^f   Dmitriev, P N ^g   Klapwijk, T M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c UNIVERSITY OF GRONINGEN   (Netherlands)

^d FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^e SRON NETHERLANDS INSTITUTE FOR SPACE RESEARCH   (Netherlands)

^f MOSCOW STATE UNIVERSITY   (Russian Federation)

^g INSTITUTE OF RADIO ENGINEERING AND ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; CHEMICAL ETCHING; ELONGATED GRAINS; ESSENTIAL ELEMENTS; EXPERIMENTAL DATA; FILM TEXTURES; IN-PLANE TEXTURE; LINE INTENSITIES; MICRO-ELECTRONIC DEVICES; NITROGEN CONCENTRATIONS; NITROGEN INJECTION; PRESSURE VARIATIONS; REACTIVE MAGNETRON SPUTTERING; SPUTTERING GAS; SPUTTERING PRESSURES; SPUTTERING YIELDS; SUBSTRATE TEMPERATURE; SUPERCONDUCTING MICROELECTRONICS; TECHNOLOGICAL FACTORS; TEXTURE FORMATION; THERMALIZATION; TOTAL GAS PRESSURE; WEAR RESISTANCE OF TOOLS; XRD; XRD PATTERNS;

ADATOMS; ARGON; DIFFUSION COATINGS; METALLIC FILMS; MICROELECTRONICS; NIOBIUM; NITRIDES; NITROGEN; SUPERCONDUCTING DEVICES; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

TEXTURES;

EID: 18744375751     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1510589     Document Type: Article

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